Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL7879377

CCCCCCCCCCCCc1ccc(Oc2ccc(S(=O)(=O)O)cc2S(=O)(=O)O)cc1.N.N

nearest known ligand 0.51

Full drug profile on Sugi Atlas →

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
S1PR3 Q99500 1/20 0.46
CA2 P00918 1/20 0.45
ICAM1 P05362 1/20 0.42
SELE P16581 1/20 0.42
THRA P10827 1/20 0.41
THRB P10828 1/20 0.41
TBXA2R P21731 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diethanolamine SCHEMBL7877506 0.90 S1PR3 (0.41) S1PR3TBXA2R
SCHEMBL14520051 0.84 PPARG (0.43) S1PR3
SCHEMBL14520049 0.84 PPARG (0.45) S1PR3
Ammonia Solution, Strong SCHEMBL7878966 0.83 S1PR3 (0.44) S1PR3
SCHEMBL10671280 0.83
SCHEMBL13001890 0.83 CA2 (0.55) S1PR3CA2THRATHRB
SCHEMBL13001886 0.83 CA2 (0.55) S1PR3CA2THRATHRB
SCHEMBL13001887 0.83 CA2 (0.55) S1PR3CA2THRATHRB
SCHEMBL13001889 0.83 CA2 (0.55) S1PR3CA2THRATHRB
SCHEMBL20358129 0.83 THRB (0.45) THRATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6329126-B1 WITHOUT FILM RESIDUE OR DEPOSITION OF SCUM AND GIVING HIGH RESOLUTION; NITROGEN-CONTAINING ORGANIC BASIC COMPOUND, E.G., AMINE SUCH AS TETRAMETHYL AMMONIUM HYDROXIDE, A DIPHENYL ETHER HAVING AN AMMOUNIUM SULFONATE GROUP AS ANIONIC SURFACTANT; TOKYO OHKA KOGYO CO., LTD. (JP) 2001-12-11 US disclosed
US-5985525-A Developer solution for photoresist composition TOKYO OHTA KOGYO CO., LTD. (JP) 1999-11-16 US disclosed
US-5543268-A WATER, NITROGEN CONTAINING BASE, ANIONIC SURFACTANT; HIGH RESOLUTION TOKYO OHKA KOGYO CO., LTD. (JP) 1996-08-06 US disclosed