SCHEMBL7881968

SCHEMBL7881968

CC(O)CC(C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15354078 0.82 CHRNB2 (0.35)
SCHEMBL28380632 0.79 CHRNB2 (0.32)
SCHEMBL6426171 0.78 TSHR (0.37)
SCHEMBL19397684 0.76
SCHEMBL18900262 0.76
SCHEMBL438504 0.76
SCHEMBL27564054 0.75 TSHR (0.35)
SCHEMBL3674666 0.75
SCHEMBL10344194 0.75 CHRNB2 (0.43)
SCHEMBL587019 0.75 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180322-B1 DEVELOPING THIN FILM, MADE FROM RADIATION SENSITIVE COMPOSITION COMPRISING ALKALI-SOLUBLE RESIN AND RADIATION SENSITIVE COMPOUND AND HAVING LATENT IMAGE PATTERN, WITH ALKALINE DEVELOPING SOLUTION TO FORM THIN FILM PATTERN WHEREIN JSR CORPORATION (JP) 2001-01-30 US disclosed