Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRSS1 | P07477 | 9/20 | 0.56 |
| ▸ | F2 | P00734 | 1/20 | 0.54 |
| ▸ | PLG | P00747 | 1/20 | 0.54 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.54 |
| ▸ | C1S | P09871 | 1/20 | 0.54 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.54 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.48 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.47 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.47 |
| ▸ | NAAA | Q02083 | 1/20 | 0.47 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.46 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7889327 | 1.00 | PRSS1 (0.56) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL7896958 | 0.99 | PRSS1 (0.55) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL7900723 | 0.90 | PRSS1 (0.54) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL202127 | 0.86 | FAAH (0.58) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL204302 | 0.86 | FAAH (0.58) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL204344 | 0.84 | NR4A2 (0.56) | PRSS1F2PLGPRSS2C1S | |
| SCHEMBL7896350 | 0.84 | PLA2G4B (0.60) | F2PLGNR1H4PLA2G4B | |
| SCHEMBL7897896 | 0.84 | PLA2G4B (0.60) | F2PLGNR1H4PLA2G4B | |
| SCHEMBL7889322 | 0.84 | IGF1R (0.47) | PRSS1PRSS2PRSS3 | |
| SCHEMBL7900726 | 0.84 | IGF1R (0.47) | PRSS1PRSS2PRSS3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6277998-B1 | REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-21 | — | — | US | disclosed |
| US-6191289-B1 | REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5874593-A | SULFUR CONTAINING AMIDE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-23 | — | — | US | disclosed |
| EP-0711762-A1 | PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-05-15 | — | — | EP | disclosed |