Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3117122 | 0.70 | TDP1 (0.33) | TDP1 | |
| SCHEMBL4579555 | 0.70 | — | — | |
| SCHEMBL10024709 | 0.67 | TDP1 (0.31) | TDP1 | |
| SCHEMBL16405957 | 0.67 | TDP1 (0.40) | TDP1 | |
| SCHEMBL15135182 | 0.62 | — | — | |
| SCHEMBL15310104 | 0.62 | — | — | |
| SCHEMBL6630211 | 0.60 | — | — | |
| SCHEMBL29115720 | 0.60 | — | — | |
| SCHEMBL15132744 | 0.57 | TDP1 (0.64) | TDP1 | |
| Hydrochloric Acid SCHEMBL27662926 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 311 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-20250305131-A1 | LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE | GELEST, INC. | 2025-10-02 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| US-20250169332-A1 | DISPLAY DEVICE AND METHOD OF FABRICATION FOR THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-05-22 | — | — | US | claimed |
| CN-120021392-A | Display device and method of manufacturing the same | 三星显示有限公司 | 2025-05-20 | — | — | CN | claimed |
| US-20250160174-A1 | DISPLAY DEVICE AND METHOD OF FABRICATION FOR THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-05-15 | — | — | US | claimed |
| US-20250133935-A1 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-04-24 | — | — | US | claimed |
| EP-4543181-A1 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | Samsung Display Co., Ltd. (KR) | 2025-04-23 | — | — | EP | claimed |
| CN-119855379-A | Display device and method of manufacturing the same | 三星显示有限公司 | 2025-04-18 | — | — | CN | claimed |
| US-20250089528-A1 | DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2025-03-13 | — | — | US | claimed |
| EP-2058416-A2 | Preparation of a metal-containing film via ALD or CVD processes | Air Products and Chemicals, Inc. (US) | 2009-05-13 | — | — | EP | claimed |
| EP-1691400-B1 | Preparation of metal silicon nitride films via cyclic deposition | AIR PROD & CHEM (US) | 2009-01-14 | — | — | EP | claimed |
| EP-2009139-A1 | Cyclic Deposition Method for Depositing a Metal Silicon Nitride Film | Air Products and Chemicals, Inc. (US) | 2008-12-31 | — | — | EP | claimed |
| US-20080318443-A1 | Plasma enhanced cyclic deposition method of metal silicon nitride film | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-12-25 | — | — | US | claimed |
| WO-2008121463-A1 | METHOD FOR FORMING STRAINED SILICON NITRIDE FILMS AND A DEVICE CONTAINING SUCH FILMS | TOKYO ELECTRON LIMITED (JP) | 2008-10-09 | — | — | WO | claimed |
| US-20080242116-A1 | Method for forming strained silicon nitride films and a device containing such films | TOKYO ELECTRON LIMITED (JP) | 2008-10-02 | — | — | US | claimed |
| US-20060182885-A1 | Preparation of metal silicon nitride films via cyclic deposition | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | claimed |
| EP-1691400-A1 | Preparation of metal silicon nitride films via cyclic deposition | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | claimed |
| US-20050048204-A1 | Method for the fabrication of silicon nitride, silicon oxynitride, and silicon oxide films by chemical vapor deposition | L'AIR LIQUIDE, SOCIETE SNONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR I'ETUDE EL I'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2005-03-03 | — | — | US | claimed |
| WO-2003046254-A1 | METHOD FOR THE FABRICATION OF SILICON NITRIDE, SILICON OXYNITRIDE, AND SILICON OXIDE FILMS BY CHEMICAL VAPOR DEPOSITION | L'AIR LIQUIDE, SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2003-06-05 | — | — | WO | claimed |