SCHEMBL7898447

SCHEMBL7898447

CC(=O)c1ccc(C(=O)O)cc1C(C)=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.52
TSHR P16473 3/20 0.48
TP53 P04637 1/20 0.48
AKR1C3 P42330 8/20 0.47
AKR1C2 P52895 8/20 0.47
MYC P01106 1/20 0.47
GAA P10253 2/20 0.47
ALDH1A1 P00352 2/20 0.47
RAB9A P51151 1/20 0.47
CA12 O43570 2/20 0.46
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
CA4 P22748 2/20 0.46
CA6 P23280 2/20 0.46
CA7 P43166 2/20 0.46
CA9 Q16790 2/20 0.46
CA14 Q9ULX7 2/20 0.46
POLB P06746 1/20 0.46
MAPT P10636 1/20 0.46
PTGS2 P35354 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15507330 0.93 KDM4E (0.60) KDM4ETSHRTP53AKR1C3AKR1C2
SCHEMBL15369488 0.93 KDM4E (0.55) KDM4ETSHRTP53AKR1C3AKR1C2
SCHEMBL19329021 0.91 KDM4E (0.58) KDM4ETSHRTP53AKR1C3AKR1C2
SCHEMBL50489 0.86 AKR1C3 (0.49) AKR1C3AKR1C2ALDH1A1RAB9AMAPT
SCHEMBL29361599 0.86 AKR1C3 (0.49) AKR1C3AKR1C2ALDH1A1RAB9AMAPT
SCHEMBL16261358 0.84 AKR1C3 (0.57) AKR1C3AKR1C2POLBL3MBTL1AKR1C4
SCHEMBL4623376 0.84 AKR1C3 (0.57) KDM4EAKR1C3AKR1C2POLBL3MBTL1
SCHEMBL10936859 0.84 TSHR (0.52) KDM4ETSHRTP53MYCGAA
SCHEMBL10046615 0.84 L3MBTL1 (0.48) KDM4ETSHRAKR1C3AKR1C2GAA
SCHEMBL11951520 0.84 POLB (0.65) KDM4EAKR1C3AKR1C2ALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108780275-B Photosensitive film 东丽株式会社 2022-11-08 CN disclosed
CN-113527680-A Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-107407878-B Photosensitive resin composition 东丽株式会社 2020-11-17 CN disclosed
CN-111830785-A Resin composition, method for forming pattern, method for forming cured coating, interlayer insulating film, surface protective film, and electronic component 信越化学工业株式会社 2020-10-27 CN disclosed
CN-102727493-B Applications of TEMPOL derivatives as anti-tumor drugs FOURTH MILITARY MEDICAL UNIV 2014-04-23 CN disclosed
WO-2011029459-A1 NOVEL PHOTOACTIVABLE FLUORESCENT DYES FOR OPTICAL MICROSCOPY AND IMAGE TECHNIQUES MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. (DE) 2011-03-17 WO disclosed
US-6187754-B1 Sialyl-Lewisa and sialyl-Lewisx epitode analogues GLYCOTECH CORP. 2001-02-13 US disclosed
EP-0886639-A1 SIALYL-LEWISa AND SIALYL-LEWISx EPITOPE ANALOGUES GlycoTech Corp. (US) 1998-12-30 EP disclosed
WO-1997028174-A1 SIALYL-LEWISa AND SIALYL-LEWISx EPITOPE ANALOGUES NOVARTIS AG (CH) 1997-08-07 WO disclosed