SCHEMBL7919906

SCHEMBL7919906

OC1Cc2ccccc2OC1(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MAOB P27338 10/20 0.35
MAOA P21397 9/20 0.35
SCD O00767 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
CAMK2A Q9UQM7 1/20 0.33
AOC2 O75106 4/20 0.32
DAO P14920 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5182985 0.83 CYP2C9 (0.36) MAOBMAOASCDCYP2C9CYP2C19
SCHEMBL29416859 0.81 HSP90AA1 (0.38) MAOBMAOASCDAOC2
SCHEMBL1887520 0.81 HSP90AA1 (0.38) MAOBMAOASCDAOC2
SCHEMBL16499182 0.80 MAOB (0.34) MAOBMAOASCDAOC2DAO
SCHEMBL31742548 0.80 MAOB (0.33) MAOBMAOASCDAOC2DAO
SCHEMBL10601488 0.80 MAOB (0.33) MAOBMAOASCDAOC2DAO
SCHEMBL28942665 0.78 MAOB (0.40) MAOBMAOA
SCHEMBL3310654 0.77 MGAM (0.47) MAOBMAOA
SCHEMBL30146748 0.77 MAOA (0.39) MAOBMAOASCDAOC2DAO
SCHEMBL8370012 0.77 MGAM (0.47) MAOBMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0633499-A1 Radiation sensitive resist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-01-11 EP claimed
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed
US-20200272050-A1 Enhanced EUV Photoresist Materials, Formulations and Processes IRRESISTIBLE MATERIALS, LTD (GB) 2020-08-27 US disclosed
CN-110998437-A Multi-trigger photoresist compositions and methods A·P·G·罗宾森 2020-04-10 CN disclosed
US-10095112-B2 Multiple trigger photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2018-10-09 US disclosed
US-20180246408-A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS IRRESISTIBLE MATERIALS, LTD (GB) 2018-08-30 US disclosed
US-9519215-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS, LTD (GB) 2016-12-13 US disclosed
US-20160246173-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-08-25 US disclosed
US-9383646-B2 Two-step photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2016-07-05 US disclosed
US-9229322-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-01-05 US disclosed
EP-2920142-A1 METHANOFULLERENES Robinson, Alex Philip, Graham (GB) 2015-09-23 EP disclosed
US-20150241773-A1 Two-Step Photoresist Compositions and Methods IRRESISTIBLE MATERIALS LTD (GB) 2015-08-27 US disclosed
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US disclosed
WO-2014137663-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-09-12 WO disclosed
WO-2014078097-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-05-22 WO disclosed
US-RE37179-E1 ADDITION POLYMER JSR CORPORATION (JP) 2001-05-15 US disclosed
US-5413896-A Light sensitive element with novolak resin and quinonediazide compounds JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-05-09 US disclosed
EP-0633499-A1 Radiation sensitive resist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-01-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10095112-B2 Multiple trigger photoresist compositions and methods ERCC4, ERCC2, APEX1 MAOB 2749/4885MAOA 2303/4885SCD 1864/4885
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom HNRNPM, TUFM, MSR1 MAOB 4691/4885MAOA 4394/4885SCD 1701/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.