Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 13/20 | 0.70 |
| ▸ | ESR2 | Q92731 | 11/20 | 0.70 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.70 |
| ▸ | AR | P10275 | 2/20 | 0.70 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.70 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.70 |
| ▸ | HPGD | P15428 | 1/20 | 0.70 |
| ▸ | TSHR | P16473 | 1/20 | 0.70 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.70 |
| ▸ | HTR6 | P50406 | 1/20 | 0.70 |
| ▸ | ESRRG | P62508 | 1/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.70 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.70 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | TYR | P14679 | 1/20 | 0.50 |
| ▸ | SHBG | P04278 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4905749 | 1.00 | ESR1 (0.70) | ESR1ESR2CYP3A4ARSLC6A2 | |
| SCHEMBL1070864 | 0.87 | ESR1 (0.70) | ESR1ESR2CYP3A4ARSLC6A2 | |
| SCHEMBL7124669 | 0.87 | ESR1 (0.70) | ESR1ESR2CYP3A4ARSLC6A2 | |
| SCHEMBL12721606 | 0.87 | ESR1 (0.70) | ESR1ESR2CYP3A4ARSLC6A2 | |
| SCHEMBL7809653 | 0.84 | ESR1 (0.73) | ESR1ESR2CYP3A4ARSLC6A2 | |
| Bisphenol A SCHEMBL29419665 | 0.84 | ESR1 (0.80) | ESR1ESR2CYP3A4ARSLC6A2 | |
| Bisphenol A SCHEMBL28857248 | 0.84 | ESR1 (0.80) | ESR1ESR2CYP3A4ARSLC6A2 | |
| SCHEMBL10593295 | 0.83 | ESR1 (1.00) | ESR1ESR2CYP3A4ARSLC6A2 | |
| SCHEMBL26946 | 0.83 | ESR1 (1.00) | ESR1ESR2CYP3A4ARSLC6A2 | |
| Bisphenol A SCHEMBL15062 | 0.83 | ESR1 (1.00) | ESR1ESR2CYP3A4ARSLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117836927-A | Resin cured film, semiconductor device, and method for manufacturing semiconductor device | 株式会社力森诺科 | 2024-04-05 | — | — | CN | disclosed |
| CN-117280447-A | Photosensitive resin composition selection method, pattern cured film production method, cured film, semiconductor device, and semiconductor device production method | 株式会社力森诺科 | 2023-12-22 | — | — | CN | disclosed |
| CN-110582726-B | Positive photosensitive resin composition, thermal crosslinking agent for positive photosensitive resin, pattern cured film, method for producing pattern cured film, semiconductor element, and electronic device | 株式会社力森诺科 | 2023-08-04 | — | — | CN | disclosed |
| CN-116194840-A | Photosensitive resin composition, permanent resist, method for forming permanent resist, and method for inspecting cured film for permanent resist | 株式会社力森诺科 | 2023-05-30 | — | — | CN | disclosed |
| CN-115398339-A | Photosensitive resin composition, method for producing patterned cured film, and semiconductor device | 昭和电工材料株式会社 | 2022-11-25 | — | — | CN | disclosed |
| CN-115151868-A | Photosensitive resin composition, method for sorting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device | 昭和电工材料株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-104823110-B | Photosensitive resin composition, photosensitive film, and method for forming resist pattern | 昭和电工材料株式会社 | 2021-06-04 | — | — | CN | disclosed |
| CN-106019841-B | Photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device | 东京应化工业株式会社 | 2021-03-26 | — | — | CN | disclosed |
| CN-106687864-B | Photosensitive resin composition, photosensitive element, cured product, semiconductor device, method for forming resist pattern, and method for producing circuit substrate | 日立化成株式会社 | 2020-07-03 | — | — | CN | disclosed |
| CN-110998437-A | Multi-trigger photoresist compositions and methods | A·P·G·罗宾森 | 2020-04-10 | — | — | CN | disclosed |
| CN-110582726-A | Positive photosensitive resin composition, heat crosslinking agent for positive photosensitive resin, patterned cured film and method for producing same, semiconductor element, and electronic device | 日立化成株式会社 | 2019-12-17 | — | — | CN | disclosed |
| CN-108027561-A | Negative light-sensitive resin combination, cured film, the element for possessing cured film and display device and its manufacture method | 东丽株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-107409457-A | Organic EL display and its manufacture method | 东丽株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-106795107-A | Sulfonate compound, light acid producing agent and photoetching resin combination | 三亚普罗股份有限公司 | 2017-05-31 | — | — | CN | disclosed |
| CN-100336137-C | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same | JSR CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| CN-1505820-A | Composition for forming photosensitive dielectric, and decal film, dielectric and electronic component using the same | ������ʱ����ʽ���� | 2004-06-16 | — | — | CN | disclosed |
| US-RE37179-E1 | ADDITION POLYMER | JSR CORPORATION (JP) | 2001-05-15 | — | — | US | disclosed |