⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9849724 | 0.65 | ALDH1A1 (0.30) | — | |
| SCHEMBL4932101 | 0.62 | — | — | |
| SCHEMBL2875372 | 0.61 | TP53 (0.35) | — | |
| SCHEMBL2007725 | 0.61 | GABRA1 (0.31) | — | |
| SCHEMBL10974274 | 0.59 | — | — | |
| SCHEMBL136621 | 0.58 | — | — | |
| SCHEMBL6232376 | 0.58 | — | — | |
| SCHEMBL347172 | 0.55 | — | — | |
| SCHEMBL1647240 | 0.55 | — | — | |
| SCHEMBL5522565 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0592790-A1 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-20 | — | — | EP | claimed |
| US-6225476-B1 | ACRYLIC ESTER COMPOUND HAVING ALKOXYCARBONYL GROUP OR GROUP DERIVED FROM MOLECULE OF LACTONE COMPOUND BY REMOVING HYDROGEN ATOM BONDED TO CARBON ATOM; MONOMER OF FILM-FORMING RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-05-01 | — | — | US | disclosed |
| US-6087063-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| EP-0592790-B1 | Negative photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1998-03-11 | — | — | EP | disclosed |
| EP-0588092-B1 | Negtive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1996-03-27 | — | — | EP | disclosed |
| EP-0592790-A1 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-20 | — | — | EP | disclosed |
| EP-0588092-A2 | Negtive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-03-23 | — | — | EP | disclosed |