SCHEMBL910068

SCHEMBL910068

O=C(NC1CCCCC1)OCc1c([N+](=O)[O-])cccc1[N+](=O)[O-]

nearest known ligand 0.57

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 4/20 0.57
ALDH1A1 P00352 5/20 0.54
GAA P10253 1/20 0.54
KMT2A Q03164 3/20 0.52
MEN1 O00255 2/20 0.48
KDM4E B2RXH2 1/20 0.48
NPC1 O15118 2/20 0.47
RAB9A P51151 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.46
MAPT P10636 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13020964 0.86 EPHX1 (0.62) EPHX1ALDH1A1GAAKMT2AMEN1
SCHEMBL12892548 0.86 EPHX1 (0.62) EPHX1ALDH1A1GAAKMT2AMEN1
SCHEMBL2202790 0.86 EPHX1 (0.54) EPHX1ALDH1A1GAAKMT2AMEN1
SCHEMBL793387 0.86 EPHX1 (0.62) EPHX1ALDH1A1GAAKMT2AMEN1
SCHEMBL8079942 0.82 KMT2A (0.45) EPHX1ALDH1A1GAAKMT2AMEN1
SCHEMBL28421022 0.82 ALDH1A1 (0.47) ALDH1A1GAAKMT2AMEN1KDM4E
SCHEMBL2199928 0.80 EPHX1 (0.57) EPHX1ALDH1A1GAAKMT2AMEN1
SCHEMBL4916180 0.79 EPHX1 (0.57) EPHX1ALDH1A1KDM4ENPC1RAB9A
SCHEMBL2200272 0.78 EPHX1 (0.56) EPHX1ALDH1A1KDM4ENPC1RAB9A
SCHEMBL2674274 0.78 KMT2A (0.53) ALDH1A1GAAKMT2AMEN1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 255 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US claimed
US-20100078598-A1 CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING ELPANI CO., LTD. (KR) 2010-04-01 US claimed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US claimed
US-6703190-B2 Method for producing resist structures INFINEON TECHNOLOGIES AG (DE) 2004-03-09 US claimed
US-20030008240-A1 Method for producing resist structures POLARIS INNOVATIONS LIMITED (IE) 2003-01-09 US claimed
EP-1247141-A1 CREATION OF RESIST STRUCTURES Infineon Technologies AG (DE) 2002-10-09 EP claimed
WO-2001042860-A1 CREATION OF RESIST STRUCTURES INFINEON TECHNOLOGIES AG (DE) 2001-06-14 WO claimed
WO-2001042859-A1 PRODUCTION OF RESIST STRUCTURES INFINEON TECHNOLOGIES AG (DE) 2001-06-14 WO claimed
US-12607931-B2 Photosensitive transfer material, light shielding material, LED array, and electronic apparatus FUJIFILM CORPORATION (JP) 2026-04-21 US disclosed
US-12479960-B2 Triazine ring-containing polymer and film forming composition containing same NISSAN CHEMICAL CORPORATION (JP) 2025-11-25 US disclosed
US-12426166-B2 Method of manufacturing conductive pattern, touch sensor, electromagnetic wave shield, antenna, wiring board, conductive heating element, and structure FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
WO-2025099025-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME MERCK PATENT GMBH (DE) 2025-05-15 WO disclosed
WO-2025034474-A1 3D PRINTED POROUS SUPRAMOLECULAR SORBENTS BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 2025-02-13 WO disclosed
WO-2025013746-A1 PATTERN-FORMING COMPOSITION 日産化学株式会社 2025-01-16 WO disclosed
US-6180320-B1 Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2001-01-30 US disclosed
WO-2000064959-A1 COMPOSITION COMPRISING MERCAPTO-FUNCTIONAL COMPOUNDS AKZO NOBEL N.V. (NL) 2000-11-02 WO disclosed
US-6087072-A Article having a light-controllable super-water-repellent surface and a printing machine using the article HITACHI, LTD. (JP) 2000-07-11 US disclosed
US-6027852-A Article having a light-controllable super-water-repellent surface and a printing machine using the article HITACHI, LTD. (JP) 2000-02-22 US disclosed
US-5691100-A SEMICONDUCTORS HOECHST JAPAN LIMITED (JP) 1997-11-25 US disclosed
EP-0633502-A1 PATTERN FORMING MATERIAL HOECHST JAPAN LIMITED (JP) 1995-01-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12607931-B2 Photosensitive transfer material, light shielding material, LED array, and electronic apparatus SETD1B, NLRP1, MAP1LC3B EPHX1 1938/4885ALDH1A1 1082/4885GAA 4487/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.