SCHEMBL7937089

SCHEMBL7937089

COCc1cccc(COC)c1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.54
GABRB2 P47870 2/20 0.54
IDO1 P14902 3/20 0.50
PRKCE Q02156 3/20 0.48
ALDH1A1 P00352 3/20 0.48
MYLK Q15746 2/20 0.48
MAPT P10636 2/20 0.48
MEN1 O00255 1/20 0.48
PRKCG P05129 1/20 0.48
PRKCA P17252 1/20 0.48
APEX1 P27695 1/20 0.48
RECQL P46063 1/20 0.48
KMT2A Q03164 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
KDM4E B2RXH2 2/20 0.42
ALOX12 P18054 2/20 0.42
NPC1 O15118 1/20 0.42
HTT P42858 1/20 0.42
RAB9A P51151 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19680379 0.93 GABRA1 (0.48) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL28425130 0.91 GABRA1 (0.71) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL14378429 0.88 GABRA1 (0.48) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL18382507 0.88 GABRA1 (0.43) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL13318414 0.87 ALDH1A1 (0.52) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL24403685 0.85 HSP90AA1 (0.49) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL21794367 0.85 IDO1 (0.47) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL18657301 0.84 GABRA1 (0.59) GABRA1GABRB2IDO1ALDH1A1MAPT
SCHEMBL28425121 0.82 GABRA1 (0.57) GABRA1GABRB2IDO1PRKCEALDH1A1
SCHEMBL16534556 0.80 IDO1 (0.51) GABRA1GABRB2IDO1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115407610-B Photosensitive resin composition, preparation method and application thereof 明士(北京)新材料开发有限公司 2023-05-16 CN claimed
CN-115407610-A Photosensitive resin composition and preparation method and application thereof 明士(北京)新材料开发有限公司 2022-11-29 CN claimed
CN-114524938-A Polymer, photosensitive resin composition, cured film prepared from same and electronic element 江苏三月科技股份有限公司 2022-05-24 CN claimed
CN-110312698-A Between producing high-purity, bis- (4- alkylphenol) derivatives of m- coupling and application thereof 鲁汶天主教大学 2019-10-08 CN claimed
US-6281320-B1 POLYOLEFIN CATALYST UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION 2001-08-28 US claimed
WO-2026105609-A1 COMPOSITION, LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 東レ株式会社 2026-05-21 WO disclosed
CN-119768741-A Positive photosensitive resin composition 日产化学株式会社 2025-04-04 CN disclosed
CN-119604817-A Positive photosensitive resin composition 日产化学株式会社 2025-03-11 CN disclosed
WO-2025047702-A1 COMPOSITION FOR PATTERNING AND USE OF SAME 日産化学株式会社 2025-03-06 WO disclosed
WO-2025047700-A1 COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF 日産化学株式会社 2025-03-06 WO disclosed
CN-118192168-A Photosensitive resin composition 日产化学株式会社 2024-06-14 CN disclosed
CN-115959977-B Preparation method of 1, 1-tris (3, 5-dimethoxy methyl-4-hydroxyphenyl) ethane 陕西泰合利华工业有限公司 2024-06-11 CN disclosed
WO-2013124459-A2 CONTINUOUS PROCESS FOR CONVERSION OF LIGNIN TO USEFUL COMPOUNDS CHEMTEX ITALIA S.P.A. (IT) 2013-08-29 WO disclosed
US-20130225854-A1 CONTINUOUS PROCESS FOR CONVERSION OF LIGNIN TO USEFUL COMPOUNDS Chemtex Italia, S.p.A. (IT) 2013-08-29 US disclosed
US-20130225853-A1 CONTINUOUS PROCESS FOR CONVERSION OF LIGNIN TO USEFUL COMPOUNDS Chemtex Italia, S.p.A. (IT) 2013-08-29 US disclosed
US-20130225856-A1 CONTINUOUS PROCESS FOR CONVERSION OF LIGNIN TO USEFUL COMPOUNDS Chemtex Italia, S.p.A. (IT) 2013-08-29 US disclosed
WO-2013124461-A2 CONTINUOUS PROCESS FOR CONVERSION OF LIGNIN TO USEFUL COMPOUNDS CHEMTEX ITALIA S.P.A. (IT) 2013-08-29 WO disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-6281320-B1 POLYOLEFIN CATALYST UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION 2001-08-28 US disclosed