SCHEMBL793840

SCHEMBL793840

O=C(OCC1c2ccccc2-c2ccccc21)N1CCC(CCCC2CCN(C(=O)OCC3c4ccccc4-c4ccccc43)CC2)CC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.45
CHRM4 P08173 1/20 0.44
FAAH O00519 1/20 0.43
KMT2A Q03164 2/20 0.43
FABP7 O15540 1/20 0.42
FABP5 Q01469 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
POLB P06746 1/20 0.42
ALDH1A1 P00352 3/20 0.42
HDAC3 O15379 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC10 Q969S8 1/20 0.41
HDAC11 Q96DB2 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
HDAC6 Q9UBN7 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31515414 1.00 L3MBTL1 (0.45) L3MBTL1CHRM4FAAHKMT2AFABP7
SCHEMBL21250120 0.94 ACHE (0.48) L3MBTL1CHRM4FAAHKMT2APOLB
SCHEMBL31677325 0.94 L3MBTL1 (0.43) L3MBTL1CHRM4FAAHKMT2AFABP7
SCHEMBL30966194 0.94 L3MBTL1 (0.43) L3MBTL1CHRM4FAAHKMT2AFABP7
SCHEMBL15353779 0.93 L3MBTL1 (0.47) L3MBTL1CHRM4FAAHKMT2APOLB
SCHEMBL799719 0.92 KMT2A (0.52) L3MBTL1CHRM4FAAHKMT2AFABP7
SCHEMBL8606944 0.89 KMT2A (0.48) L3MBTL1CHRM4FAAHKMT2AFABP7
SCHEMBL13081616 0.88 L3MBTL1 (0.39) L3MBTL1CHRM4FAAHKMT2AFABP7
SCHEMBL19633062 0.88 L3MBTL1 (0.46) L3MBTL1KMT2AFABP7FABP5SMN1; SMN2
SCHEMBL30966206 0.88 L3MBTL1 (0.42) L3MBTL1CHRM4KMT2AFABP7FABP5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230294064-A1 SUBSTRATES, SYSTEMS, AND METHODS FOR NUCLEIC ACID ARRAY SYNTHESIS VIBRANT HOLDINGS, LLC 2023-09-21 US claimed
US-20190262794-A1 SUBSTRATES, SYSTEMS, AND METHODS FOR NUCLEIC ACID ARRAY SYNTHESIS VIBRANT HOLDINGS, LLC 2019-08-29 US claimed
EP-3402897-A1 SUBSTRATES, SYSTEMS, AND METHODS FOR NUCLEIC ACID ARRAY SYNTHESIS Vibrant Holdings, LLC (US) 2018-11-21 EP claimed
WO-2017117292-A1 SUBSTRATES, SYSTEMS, AND METHODS FOR NUCLEIC ACID ARRAY SYNTHESIS VIBRANT HOLDINGS, LLC (US) 2017-07-06 WO claimed
EP-2920272-A2 SUBSTRATES, SYSTEMS, AND METHODS FOR ARRAY SYNTHESIS AND BIOMOLECULAR ANALYSIS Vibrant Holdings, LLC (US) 2015-09-23 EP claimed
WO-2014078606-A2 SUBSTRATES, SYSTEMS, AND METHODS FOR ARRAY SYNTHESIS AND BIOMOLECULAR ANALYSIS VIBRANT HOLDINGS, LLC (US) 2014-05-22 WO claimed
EP-4556467-A2 METHODS FOR ARRAY SYNTHESIS Vibrant Holdings, LLC (US) 2025-05-21 EP disclosed
US-12251674-B2 Substrates, systems, and methods for array synthesis and biomolecular analysis VIBRANT HOLDINGS, LLC (US) 2025-03-18 US disclosed
EP-3617219-B1 METHODS FOR ARRAY SYNTHESIS VIBRANT HOLDINGS LLC (US) 2025-02-26 EP disclosed
US-20230294064-A1 SUBSTRATES, SYSTEMS, AND METHODS FOR NUCLEIC ACID ARRAY SYNTHESIS VIBRANT HOLDINGS, LLC 2023-09-21 US disclosed
US-20200406220-A1 Substrates, Systems, and Methods for Array Synthesis and Biomolecular Analysis VIBRANT HOLDINGS, LLC 2020-12-31 US disclosed
US-20200406220-A1 Substrates, Systems, and Methods for Array Synthesis and Biomolecular Analysis VIBRANT HOLDINGS, LLC 2020-12-31 US disclosed
US-10799845-B2 Substrates, systems, and methods for array synthesis and biomolecular analysis VIBRANT HOLDINGS, LLC (US) 2020-10-13 US disclosed
WO-2009074522-A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-06-18 WO disclosed
WO-2009074522-A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-06-18 WO disclosed
US-20090155718-A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-06-18 US disclosed
US-7402374-B2 Method for colored image formation FUJIFILM CORPORATION (JP) 2008-07-22 US disclosed
US-7402374-B2 Method for colored image formation FUJIFILM CORPORATION (JP) 2008-07-22 US disclosed
US-20080070154-A1 DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME FUJIFILM CORPORATION (JP) 2008-03-20 US disclosed
US-20080070154-A1 DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME FUJIFILM CORPORATION (JP) 2008-03-20 US disclosed