SCHEMBL7939443

SCHEMBL7939443

C=C(C)C(Cl)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.46
HPGD P15428 1/20 0.45
LMNA P02545 2/20 0.38
ADRA2A P08913 1/20 0.37
ADRA2C P18825 1/20 0.37
HIF1A Q16665 1/20 0.37
KDM4E B2RXH2 1/20 0.37
NOS2 P35228 1/20 0.36
CYP3A4 P08684 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
CYP2D6 P10635 1/20 0.36
SRC P12931 1/20 0.36
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10645733 0.78 TSHR (0.48) TSHRHPGDLMNAMEN1KMT2A
SCHEMBL10984767 0.78 TSHR (0.48) TSHRHPGDLMNAADRA2AADRA2C
SCHEMBL356020 0.76 LMNA (0.47) TSHRHPGDLMNACYP3A4MEN1
SCHEMBL16560504 0.76 TSHR (0.46) TSHRHPGDLMNAADRA2AADRA2C
SCHEMBL1950755 0.76 LMNA (0.43) TSHRHPGDLMNAALDH1A1
SCHEMBL9272891 0.75 SRC (0.50) HPGDLMNAADRA2AADRA2CHIF1A
SCHEMBL9806266 0.75 HPGD (0.48) HPGDLMNAADRA2AADRA2CHIF1A
SCHEMBL13849535 0.73 HPGD (0.63) TSHRHPGDLMNAADRA2AADRA2C
SCHEMBL2249346 0.73 HPGD (0.63) TSHRHPGDLMNAADRA2AADRA2C
SCHEMBL12468637 0.73 HPGD (0.63) TSHRHPGDLMNAADRA2AADRA2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0344021-B1 Para-alkylstyrene/isoolefin copolymers EXXONMOBIL CHEM PATENTS INC (US) 2001-11-07 EP disclosed
EP-0609737-B1 Process for producing a halogenated butyl rubber BAYER INC (CA) 2000-06-07 EP disclosed
US-5959049-A COPOLYMERIZATION IN THE PRESENCE OF A DILUENT, AND A LEWIS ACID CATALYST, AND MAINTAINING THE COPOLYMERIZATION REACTOR SUBSTANTIALLY FREE OF IMPURITIES WHICH CAN COMPLEX WITH THE CATALYST OR COPOLYMERIZE WITH THE ISOOLEFIN OR THE EXXON CHEMICAL PATENTS INC (US) 1999-09-28 US disclosed
US-5654379-A USING FREE RADICAL CATALYST EXXON CHEMICALS PATENT, INC. (US) 1997-08-05 US disclosed
EP-0566682-B1 ENTANGLEMENT-INHIBITED MACROMOLECULES EXXON CHEMICAL PATENTS INC (US) 1997-01-22 EP disclosed
US-5591551-A UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating applications EXXON CHEMICAL PATENTS INC. (US) 1997-01-07 US disclosed
US-5587261-A UV/EB curable butyl copolymers for lithographic and corrosion-resistant coating EXXON CHEMICAL PATENTS INC. (US) 1996-12-24 US disclosed
US-5585416-A ULTRAVIOLET OR ELECTRON BEAM CROSSLINKING; COPOLYMER OF ISOOLEFIN AND PARA-ALKYLSTYRENE EXXON CHEMICAL PATENTS INC. (US) 1996-12-17 US disclosed
US-5585225-A P-ALKYLSTYRENE FUNCTIONALIZED WITH RADIATION REACTIVE GROUP TO IMPART RADIATION CURABILITY EXXON CHEMICAL PATENTS INC. (US) 1996-12-17 US disclosed
EP-0497758-B1 FUNCTIONALIZED COPOLYMERS OF PARA-ALKYLSTYRENE/ISOOLEFIN PREPARED BY NUCLEOPHILIC SUBSTITUTION EXXON CHEMICAL PATENTS INC (US) 1996-10-09 EP disclosed
WO-1992011322-A2 UV/EB CURABLE BUTYL COPOLYMERS FOR LITHOGRAPHIC AND CORROSION-RESISTANT COATING APPLICATIONS EXXON CHEMICAL PATENTS INC. (US) 1992-07-09 WO disclosed
WO-1991004992-A1 FUNCTIONALIZED COPOLYMERS OF PARA-ALKYLSTYRENE/ISOOLEFIN PREPARED BY NUCLEOPHILIC SUBSTITUTION EXXON CHEMICAL PATENTS INC. (US) 1991-04-18 WO disclosed
EP-0360829-A1 DEHYDROBROMINATION OF SUBSTITUTED ALPHA-HALOCUMENE. DOW CHEMICAL CO (US) 1990-04-04 EP disclosed
EP-0344021-A2 Para-alkylstyrene/isoolefin copolymers EXXON CHEMICAL PATENTS INC. (US) 1989-11-29 EP disclosed
WO-1988009319-A1 DEHYDROBROMINATION OF SUBSTITUTED alpha-HALOCUMENE THE DOW CHEMICAL COMPANY (US) 1988-12-01 WO disclosed
US-4543216-A REACTING A VINYL BENZYL HALIDE WITH AN AMINO ACID OR AMINO SULFONIC ACID NIPPON PAINT CO., LTD. (JP) 1985-09-24 US disclosed
US-4493884-A O-NAPHTHOQUINONEDIAZIDE AND AROMATIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1985-01-15 US disclosed
US-4151341-A LOW MOLECULAR WEIGHT ADDITION-CONDENSATION COPOLYMERS AS DISPERSANTS THE DOW CHEMICAL COMPANY (US) 1979-04-24 US disclosed
US-4074035-A ISOBUTYLENE AND PARA AND META CHLOROMETHYL STYRENE EXXON RESEARCH & ENGINEERING CO. (US) 1978-02-14 US disclosed
US-4020005-A Gelled reagent materials LANG JOHN L 1977-04-26 US disclosed