SCHEMBL7939669

SCHEMBL7939669

COC(=O)c1ccc2cc(OCc3ccccc3)c(C(=O)OC)cc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.53
HPGD P15428 2/20 0.53
SMPD1 P17405 1/20 0.48
HDAC1 Q13547 1/20 0.48
HDAC8 Q9BY41 1/20 0.48
HDAC6 Q9UBN7 1/20 0.48
RAB9A P51151 4/20 0.48
MAPT P10636 3/20 0.48
MAOB P27338 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.47
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
MRGPRX4 Q96LA9 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
LNPEP Q9UIQ6 2/20 0.47
NR4A1 P22736 1/20 0.47
NR4A2 P43354 1/20 0.47
NR4A3 Q92570 1/20 0.47
PPIA P62937 1/20 0.47
CTSV O60911 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8204838 0.89 HDAC8 (0.53) LMNAHPGDHDAC8RAB9AMAPT
SCHEMBL24767093 0.86 LMNA (0.46) LMNAHPGDRAB9AMAPTMAOB
SCHEMBL7947263 0.86 TDP1 (0.51) LMNAHPGDRAB9AMAPTMAOB
SCHEMBL1777985 0.86 ALOX5 (0.60) LMNAHPGDRAB9AMAPTMAOB
SCHEMBL1779167 0.85 ALOX5 (0.59) LMNAHPGDRAB9AMAPTMAOB
SCHEMBL630834 0.85 PTPN7 (0.55) LMNAHPGDMAOBMEN1KMT2A
SCHEMBL8204798 0.85 ALOX5 (0.52) HPGDMAPTMAOBMEN1KMT2A
SCHEMBL629817 0.84 MEN1 (0.46) LMNAHPGDMAPTMAOBMEN1
SCHEMBL7043044 0.84 MAPT (0.57) LMNAHPGDRAB9AMAPTMAOB
SCHEMBL24766948 0.83 LMNA (0.49) LMNAHPGDSMPD1HDAC1HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6252104-B1 3,6-DISUBSTITUTED-2-OXYNAPHTHALENE DERIVATIVES; RAW MATERIALS FOR SYNTHESIS OF SUCH MATERIALS AS DYES, PIGMENTS, PHOTOSENSITIVE MATERIALS KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2001-06-26 US disclosed
EP-0765858-B1 NAPHTHOL DERIVATIVES AND PROCESS FOR PRODUCING THE SAME UENO SEIYAKU OYO KENKYUJO KK (JP) 1999-12-22 EP disclosed
US-5847233-A Naphthol derivatives and process for producing the same KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1998-12-08 US disclosed
US-5786523-A Naphthol derivatives and process for producing the same KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1998-07-28 US disclosed
EP-0765858-A1 NAPHTHOL DERIVATIVES AND PROCESS FOR PRODUCING THE SAME KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1997-04-02 EP disclosed