SCHEMBL7946229

SCHEMBL7946229

O=C(c1ccc2cc(O)c(C(=O)N(F)c3cc(F)c(F)c(F)c3F)cc2c1)N(F)c1cc(F)c(F)c(F)c1F

nearest known ligand 0.37

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.37
HSD17B14 Q9BPX1 1/20 0.35
ESR1 P03372 4/20 0.32
ESR2 Q92731 4/20 0.32
MEN1 O00255 2/20 0.30
POLB P06746 2/20 0.30
KMT2A Q03164 2/20 0.30
USP2 O75604 1/20 0.30
F2 P00734 1/20 0.30
F10 P00742 1/20 0.30
PLG P00747 1/20 0.30
PLAU P00749 1/20 0.30
PLAT P00750 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2915007 0.74 CES2 (0.39)
SCHEMBL5889459 0.72 MAPT (0.40)
SCHEMBL7948170 0.69 NR4A1 (0.42) MEN1POLBKMT2AUSP2
SCHEMBL7946224 0.65 SRC (0.51) LCKMEN1POLBKMT2AUSP2
SCHEMBL3026712 0.65 CES2 (0.38)
SCHEMBL5541003 0.62 LCK (0.53) LCKPOLB
SCHEMBL30570062 0.62 LCK (0.53) LCKPOLB
SCHEMBL1165653 0.62 LCK (0.53) LCKPOLB
SCHEMBL29812614 0.62 LCK (0.53) LCKPOLB
SCHEMBL5694817 0.61 LCK (0.79) LCKMEN1POLBKMT2AF2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6252104-B1 3,6-DISUBSTITUTED-2-OXYNAPHTHALENE DERIVATIVES; RAW MATERIALS FOR SYNTHESIS OF SUCH MATERIALS AS DYES, PIGMENTS, PHOTOSENSITIVE MATERIALS KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 2001-06-26 US disclosed
EP-0765858-B1 NAPHTHOL DERIVATIVES AND PROCESS FOR PRODUCING THE SAME UENO SEIYAKU OYO KENKYUJO KK (JP) 1999-12-22 EP disclosed
US-5847233-A Naphthol derivatives and process for producing the same KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1998-12-08 US disclosed
US-5786523-A Naphthol derivatives and process for producing the same KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1998-07-28 US disclosed
EP-0765858-A1 NAPHTHOL DERIVATIVES AND PROCESS FOR PRODUCING THE SAME KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1997-04-02 EP disclosed