SCHEMBL7952264

SCHEMBL7952264

CC(C)C(C)OCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7963824 0.75
SCHEMBL12923472 0.75
SCHEMBL7964688 0.73
SCHEMBL1628259 0.72
SCHEMBL6182168 0.72 LMNA (0.32)
SCHEMBL2048554 0.72
SCHEMBL151448 0.72
SCHEMBL8400583 0.71 ALDH1A1 (0.30)
SCHEMBL8400580 0.69 SMN1; SMN2 (0.33)
SCHEMBL8533077 0.69 LMNA (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9518190-B2 Inkjet ink, ink cartridge, inkjet recording method, inkjet recording device, and inkjet recorded matter RICOH COMPANY, LTD. (JP) 2016-12-13 US disclosed
US-20150307729-A1 INKJET INK, INK CARTRIDGE, INKJET RECORDING METHOD, INKJET RECORDING DEVICE, AND INKJET RECORDED MATTER GOTO HIROSHI (JP) 2015-10-29 US disclosed
US-9062217-B2 Liquid composition, recording method, and recorded matter RICOH COMPANY, LTD. (JP) 2015-06-23 US disclosed
US-9033484-B2 Inkjet treatment liquid and inkjet recording apparatus RICOH COMPANY, LTD. (JP) 2015-05-19 US disclosed
US-9011588-B2 Inkjet treatment liquid and image forming method using treatment liquid RICOH COMPANY, LTD. (JP) 2015-04-21 US disclosed
US-8980408-B2 Liquid composition, recording method, and recorded matter RICOH COMPANY, LTD. (JP) 2015-03-17 US disclosed
US-8820875-B2 Image forming method and inkjet recording device using the same RICOH COMPANY, LTD. (JP) 2014-09-02 US disclosed
US-8814340-B2 Image forming method, and image formed matter RICOH COMPANY, LTD. (JP) 2014-08-26 US disclosed
US-8722175-B2 Liquid composition, recording method, and recorded matter RICOH COMPANY, LTD. (JP) 2014-05-13 US disclosed
US-8708473-B2 Inkjet recording treatment liquid, inkjet cartridge, inkjet recording ink set, and inkjet recording method RICOH COMPANY, LTD. (JP) 2014-04-29 US disclosed
US-20120128949-A1 IMAGE FORMING METHOD, AND IMAGE FORMED MATTER RICOH COMPANY, LTD. (JP) 2012-05-24 US disclosed
US-20110318543-A1 LIQUID COMPOSITION, RECORDING METHOD, AND RECORDED MATTER RICOH COMPANY, LTD. (JP) 2011-12-29 US disclosed
US-6204222-B1 SUITABLE AS HERBICIDES AND FOR DESICCATION/DEFOLIATION OF PLANTS BASF AKTIENGESELLSCHAFT (DE) 2001-03-20 US disclosed
EP-0637298-B1 SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM BASF AG (DE) 1999-03-31 EP disclosed
US-5817603-A HERBICIDES BASF AKTIENGESELLSCHAFT (DE) 1998-10-06 US disclosed
US-5602074-A HERBICIDES; PLANT DESICCATION, DEFOLIATION BASF AKTIENGESELLSCHAFT (DE) 1997-02-11 US disclosed
EP-0641321-A1 SUBSTITUTED ISOINDOLONES BASF Aktiengesellschaft (DE) 1995-03-08 EP disclosed
EP-0637298-A1 SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM BASF Aktiengesellschaft (DE) 1995-02-08 EP disclosed
WO-1993024456-A1 SUBSTITUTED ISOINDOLONES BASF AKTIENGESELLSCHAFT (DE) 1993-12-09 WO disclosed
WO-1993022280-A1 SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM BASF AKTIENGESELLSCHAFT (DE) 1993-11-11 WO disclosed