SCHEMBL795468

SCHEMBL795468

CC(F)(F)C(F)(F)C(C)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL794942 0.89
SCHEMBL13929991 0.84
SCHEMBL19846101 0.84
SCHEMBL13446223 0.84
SCHEMBL11016251 0.84
SCHEMBL1535876 0.84
SCHEMBL8047753 0.84
SCHEMBL10315960 0.80
SCHEMBL17875211 0.80
SCHEMBL1537030 0.80 LMNA (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-4346945-A None JP disclosed
EP-4400191-A1 ANTIFOAMING AGENT, LUBRICATING OIL COMPOSITION CONTAINING ANTIFOAMING AGENT, AND MACHINE USING LUBRICATING OIL COMPOSITION DIC Corporation (JP) 2024-07-17 EP disclosed
US-20230400764-A1 ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-12-14 US disclosed
EP-4221889-A1 ALLOY BASED ELECTROCHEMICAL CATALYST FOR CONVERSION OF CARBON DIOXIDE TO HYDROCARBONS UT-Battelle, LLC (US) 2023-08-09 EP disclosed
WO-2023145179-A1 METHOD AND DEVICE FOR MODIFYING FLUORORESIN ウシオ電機株式会社 2023-08-03 WO disclosed
WO-2023136478-A1 COMPOSITION FOR SURFACE TREATMENT AND OPTICAL MEMBER COATED WITH SAME 동우화인켐 주식회사 2023-07-20 WO disclosed
EP-3959284-B1 LIQUID DISPERSION WITH ENHANCED THERMAL CONDUCTIVITY CONTAINING INORGANIC PARTICLES EVONIK OPERATIONS GMBH (DE) 2023-03-29 EP disclosed
WO-2023008345-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUND 富士フイルム株式会社 2023-02-02 WO disclosed
US-11519087-B2 Alloy based electrochemical catalyst for conversion of carbon dioxide to hydrocarbons UT-BATTELLE, LLC (US) 2022-12-06 US disclosed
WO-2022158323-A1 PATTERN FORMATION METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2022-07-28 WO disclosed
EP-1701180-A1 ANTIREFLECTION FILM, ELECTROMAGNETIC WAVE SHIELDING LIGHT TRANSMITTING WINDOW MATERIAL, GAS DISCHARGE TYPE LIGHT EMITTING PANEL, FLAT DISPLAY PANEL, SHOW WINDOW MATERIAL AND SOLAR CELL MODULE Bridgestone Corporation (JP) 2006-09-13 EP disclosed
US-20060182678-A1 Block copolymer and application thereof SUMITOMO CHEMICAL COPMPANY, LIMITED 2006-08-17 US disclosed
CN-1723233-A Block copolymer and application thereof SUMITOMO CHEMICAL CO (JP) 2006-01-18 CN disclosed
EP-1555282-A1 BLOCK COPOLYMER AND APPLICATION THEREOF Sumitomo Chemical Company, Limited (JP) 2005-07-20 EP disclosed
CN-1484070-A LCD device and mfg method thereof NEC液晶技术株式会社 2004-03-24 CN disclosed
US-5298083-A Exposure of substrate to solvent ALLIEDSIGNAL INC. (US) 1994-03-29 US disclosed
US-5275669-A Degreasing glass, metal, plastic and fiber surfaces ALLIEDSIGNAL INC. (US) 1994-01-04 US disclosed
JP-H04346945-A NEW FLUORINATED HYDROCARBON AND ITS PRODUCTION SHOWA DENKO KK 1992-12-02 JP disclosed
EP-0196212-B1 ADHESIVE COMPOSITION FOR OPTICAL FIBERS RAYCHEM CORPORATION (a Delaware corporation) (US) 1991-05-08 EP disclosed
EP-0196212-A2 Adhesive composition for optical fibers RAYCHEM CORPORATION (a Delaware corporation) (US) 1986-10-01 EP disclosed