SCHEMBL7970535

SCHEMBL7970535

CCCCCCCCCCCCCCCCCCn1c(CCN(C)C)nc2ccccc21

nearest known ligand 0.59

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TLR8 Q9NR97 2/20 0.59
TP53 P04637 4/20 0.58
LMNA P02545 2/20 0.58
SMN1; SMN2 Q16637 2/20 0.58
MAPT P10636 2/20 0.56
POLB P06746 1/20 0.55
RECQL P46063 1/20 0.54
GAA P10253 1/20 0.53
HTT P42858 1/20 0.53
TDP1 Q9NUW8 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7960503 0.91 LMNA (0.57) TLR8TP53LMNASMN1; SMN2MAPT
SCHEMBL7973675 0.91 LMNA (0.57) TLR8TP53LMNASMN1; SMN2MAPT
SCHEMBL7960627 0.91 LMNA (0.57) TLR8TP53LMNASMN1; SMN2MAPT
SCHEMBL7960637 0.91 LMNA (0.57) TLR8TP53LMNASMN1; SMN2MAPT
SCHEMBL7960449 0.91 LMNA (0.57) TLR8TP53LMNASMN1; SMN2MAPT
Hydrochloric Acid SCHEMBL7970449 0.90 LMNA (0.56) TLR8TP53LMNASMN1; SMN2MAPT
Hydrochloric Acid SCHEMBL7973802 0.90 LMNA (0.56) TLR8TP53LMNASMN1; SMN2MAPT
Hydrochloric Acid SCHEMBL7973737 0.90 LMNA (0.56) TLR8TP53LMNASMN1; SMN2MAPT
Hydrochloric Acid SCHEMBL7960551 0.90 LMNA (0.56) TLR8TP53LMNASMN1; SMN2MAPT
Hydrochloric Acid SCHEMBL7976606 0.90 LMNA (0.56) TLR8TP53LMNASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6204264-B1 Benzimidazole derivative, hair growth promoter and external composition for skin using the same SHISEIDO CO., LTD. (JP) 2001-03-20 US disclosed
EP-0989123-A1 Benzimidazole derivative, hair growth promoter and external composition for skin using the same SHISEIDO COMPANY LIMITED (JP) 2000-03-29 EP disclosed