SCHEMBL798812

SCHEMBL798812

CC(CCC(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21888897 1.00
SCHEMBL7044962 0.83
SCHEMBL13914367 0.82 RIPK1 (0.37)
SCHEMBL22781132 0.82
SCHEMBL22781178 0.82
SCHEMBL25159045 0.82
SCHEMBL23516122 0.79
SCHEMBL15927980 0.79
SCHEMBL20991067 0.78
SCHEMBL7046601 0.78 LMNA (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230303602-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORPORATION (US) 2023-09-28 US disclosed
US-20230192738-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORPORATION (US) 2023-06-22 US disclosed
EP-4056578-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES Universal Display Corporation (US) 2022-09-14 EP disclosed
US-20220085302-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORPORATION (US) 2022-03-17 US disclosed
WO-2019036407-A1 PESTICIDAL AND PARASITICIDAL PYRAZOLE-ISOXAZOLINE COMPOUNDS MERIAL, INC. (US) 2019-02-21 WO disclosed
US-20160315354-A1 ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY CELL, AND MODULE DAIKIN INDUSTRIES, LTD. (JP) 2016-10-27 US disclosed
US-8318656-B2 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers E. I. DU PONT DE NEMOURS AND COMPANY (US) 2012-11-27 US disclosed
US-20120071689-A1 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS E.I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) 2012-03-22 US disclosed
US-20110213113-A1 PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM E. I. DU PONT DE NEMOURS AND COMPANY CHEMTURA CORPORATION (US) 2011-09-01 US disclosed
US-7964553-B2 Fluorinated compositions comprising at least one CF3 group and at least one CF2CH2CH(CF3) group, processes for manufacturing the fluorinated compositions, and methods for treating substrates with the fluorinated compositions; surfactants, fire extinguishants, monomers E. I. Dupont de Nmeours and Company (US) 2011-06-21 US disclosed
US-20090137773-A1 Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers ASEPSIS, INC. 2009-05-28 US disclosed
US-20080114194-A1 Halogenated compositions E. I. DU PONT DE NEMOURS AND COMPANY 2008-05-15 US disclosed
US-20080108785-A1 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2008-05-08 US disclosed
US-20080009655-A1 Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2008-01-10 US disclosed
US-20070282115-A1 Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Foams, and Foam Stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2007-12-06 US disclosed
US-20070276167-A1 Compositions, Halogenated Compositions, Chemical Production, and Telomerization Processes E. I. DU PONT DE NEMOURS AND COMPANY 2007-11-29 US disclosed
US-20070197769-A1 Exposing at least one CF3-comprising taxogen to a fluorine-comprising telogen to produce a telomer, wherein the fluorine-comprising telogen comprises at least two fluorine atoms E. I. DU PONT DE NEMOURS AND COMPANY 2007-08-23 US disclosed
US-20070161537-A1 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers GREAT LAKES CHEMICAL CORPORATION (US) 2007-07-12 US disclosed
US-20070149437-A1 Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers E. I. DU PONT DE NEMOURS AND COMPANY 2007-06-28 US disclosed
US-20070027349-A1 Halogenated Compositions GREAT LAKES CHEMICAL CORPORATION 2007-02-01 US disclosed