SCHEMBL7990626

SCHEMBL7990626

COC(C)=Cc1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.50
TSHR P16473 1/20 0.50
AKR1C3 P42330 1/20 0.50
RECQL P46063 1/20 0.47
FBP1 P09467 1/20 0.45
KDM1A O60341 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
MAPT P10636 1/20 0.42
MTNR1A P48039 2/20 0.42
MTNR1B P49286 2/20 0.42
CMA1 P23946 1/20 0.42
HTT P42858 1/20 0.41
TRPA1 O75762 1/20 0.40
GLA P06280 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
NR1I2 O75469 1/20 0.40
NPC1 O15118 2/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8225802 1.00 ALDH1A1 (0.50) ALDH1A1TSHRAKR1C3RECQLFBP1
SCHEMBL756714 0.83 ALDH1A1 (0.52) ALDH1A1TSHRAKR1C3RECQLFBP1
SCHEMBL28903785 0.83 ALDH1A1 (0.52) ALDH1A1TSHRAKR1C3RECQLFBP1
SCHEMBL1401422 0.79 ESR1 (0.54) ALDH1A1MEN1KMT2ASMN1; SMN2MAPT
SCHEMBL1682626 0.79 ABL1 (0.49) ALDH1A1FBP1
SCHEMBL57086 0.78 ALDH1A1 (0.46) ALDH1A1TSHRAKR1C3RECQLFBP1
SCHEMBL60622 0.78 ALDH1A1 (0.46) ALDH1A1TSHRAKR1C3RECQLFBP1
SCHEMBL9310266 0.77 ALDH1A1 (0.47) ALDH1A1TSHRAKR1C3RECQLFBP1
SCHEMBL14006881 0.77 TRPA1 (0.50) ALDH1A1TSHRFBP1MEN1KMT2A
SCHEMBL29137843 0.77 ALDH1A1 (0.59) ALDH1A1TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101957559-A Optical reversible nanoimprint photoresist as well as preparation method and application method thereof UNIV SHANGHAI JIAOTONG 2011-01-26 CN claimed
US-4994539-A Ethylene-unsaturated aromatic copolymer NIPPON PETROCHEMICALS CO., LTD. (JP) 1991-02-19 US claimed
CN-101620376-B Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device FUJI PHOTO FILM CO LTD 2013-09-18 CN disclosed
CN-101154042-B Curing composition for nano-imprint lithography and pattern forming method using the same FUJI PHOTO FILM CO LTD 2012-07-04 CN disclosed
CN-101105625-B Light solidifying composition and pattern forming method using the same FUJI PHOTO FILM CO LTD 2011-11-09 CN disclosed
CN-101957559-A Optical reversible nanoimprint photoresist as well as preparation method and application method thereof UNIV SHANGHAI JIAOTONG 2011-01-26 CN disclosed
CN-101620376-A Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device FUJI PHOTO FILM CO LTD 2010-01-06 CN disclosed
CN-101620377-A Curing combination for nanometer stamping, condensate and method for producing the same, and members for liquid crystal display device FUJI PHOTO FILM CO LTD 2010-01-06 CN disclosed
CN-101523305-A Volume hologram optical recording medium, composition for forming volume hologram recording layer, and volume hologram recording material MITSUBISHI CHEM CORP (JP) 2009-09-02 CN disclosed
CN-101501579-A Volume hologram optical recording medium, composition for forming volume hologram recording layer, volume hologram recording material, and volume hologram optical recording method MITSUBISHI CHEM CORP (JP) 2009-08-05 CN disclosed
CN-101154042-A Curing composition for nano-imprint lithography and pattern forming method using the same FUJIFILM CORP (JP) 2008-04-02 CN disclosed
CN-101105625-A Light solidifying composition and pattern forming method using the same FUJIFILM CORP (JP) 2008-01-16 CN disclosed
US-6143806-A ADDITION COPOLYMERIZATION OF MACROMOLECULAR MONOMERS FUJI PHOTO FILM CO., LTD. (JP) 2000-11-07 US disclosed
US-6080449-A EXCELLENT IN REDISPERSIBILITY, STORAGE STABILITY AND PRESS LIFE FUJI PHOTO FILM CO., LTD. (JP) 2000-06-27 US disclosed
US-5326489-A Sulfonated polymer NIPPON SHOKUBAI CO., LTD. (JP) 1994-07-05 US disclosed
EP-0523300-B1 Electrorheological fluids NIPPON CATALYTIC CHEM IND (JP) 1994-01-19 EP disclosed
EP-0523300-A1 Electrorheological fluids NIPPON SHOKUBAI KAGAKU KOGYO CO. LTD. (JP) 1993-01-20 EP disclosed
US-4994539-A Ethylene-unsaturated aromatic copolymer NIPPON PETROCHEMICALS CO., LTD. (JP) 1991-02-19 US disclosed
EP-0180771-A1 Method for improving impulse breakdown strength of electrically insulating materials Nippon Petrochemicals Co., Ltd. (JP) 1986-05-14 EP disclosed
US-4026951-A SPLITTING 1,1-(DIMETHOXYPHENYL) PROPANE, ACID CATALYST HAARMANN & REIMER GMBH (DT) 1977-05-31 US disclosed