SCHEMBL7994148

SCHEMBL7994148

C=C(CC)C(=O)Oc1ccccc1C

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.45
ATM Q13315 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
PPARG P37231 1/20 0.42
BCHE P06276 1/20 0.42
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
RXRG P48443 1/20 0.41
NOTUM Q6P988 1/20 0.41
ALDH1A1 P00352 3/20 0.40
MAPT P10636 2/20 0.40
NPSR1 Q6W5P4 1/20 0.40
MEN1 O00255 1/20 0.39
LMNA P02545 1/20 0.39
KMT2A Q03164 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
KDM4E B2RXH2 1/20 0.38
HTT P42858 1/20 0.38
CYP1A2 P05177 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6394195 0.86 TDP1 (0.40) TDP1ATML3MBTL1RXRARXRB
SCHEMBL5084814 0.86 TDP1 (0.45) TDP1ATML3MBTL1PPARGBCHE
SCHEMBL7058523 0.84 TDP1 (0.46) TDP1ATML3MBTL1PPARGBCHE
SCHEMBL7064558 0.82 TDP1 (0.50) TDP1ATML3MBTL1PPARGBCHE
SCHEMBL16672909 0.82 POLB (0.47) ATML3MBTL1BCHEALDH1A1MAPT
SCHEMBL21444063 0.82 GAA (0.46) TDP1ATMALDH1A1MAPTLMNA
SCHEMBL14856457 0.82 SMN1; SMN2 (0.47) ATML3MBTL1ALDH1A1MAPTMEN1
SCHEMBL27581710 0.82 L3MBTL1 (0.43) TDP1ATML3MBTL1ALDH1A1MAPT
SCHEMBL16672824 0.81 L3MBTL1 (0.54) L3MBTL1ALDH1A1MAPTNPSR1LMNA
SCHEMBL27844909 0.81 ALDH1A1 (0.47) TDP1ATML3MBTL1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6296916-B1 ANTISTATIC HARD COATINGS, LOW CURING SHRINKAGE, LOW VISCOSITY MITSUBISHI RAYON CO., LTD. (JP) 2001-10-02 US disclosed
US-6066684-A A PHOTOPOLYMERIZABLE MONOMER COMPRISING A MIXTURE OF (METH)ACRYLIC ACID ESTER MONOMER CONTAINING 2, 1, OR ONE ESTER GROUPS WITH HYDROXY AND ATLEAST AN ESTER HAVING NOHYDROXY GROUP AND PERFLUOROCARBOXYLIC OR SULFONIC METAL SALT MITSUBISHI RAYON CO., LTD. (JP) 2000-05-23 US disclosed