Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10805179 | 0.98 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL26645786 | 0.94 | POLB (0.41) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL8441937 | 0.91 | MEN1 (0.40) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL8750705 | 0.89 | MGAM (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL5521474 | 0.86 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL6299545 | 0.86 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL20357987 | 0.85 | CHRM2 (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL5679436 | 0.85 | LMNA (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL901642 | 0.85 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL3981084 | 0.85 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6284438-B1 | PROVIDING SEMICONDUCTOR SUBSTRATE; FORMING MATERIAL FILM TO BE PATTERNED ON SEMICONDUCTOR SUBSTRATE; FORMING A PHOTORESIST FILM ON THE MATERIAL FILM BY COATING PHOTORESIST; PATTERNING PHOTORESIST FILM REDUCING SIZE OF OPENING BY THERMAL FLOW | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-04 | — | — | US | claimed |
| US-6165680-A | Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-12-26 | — | — | US | claimed |
| EP-0367131-B1 | Light-sensitive composition | BASF AG (DE) | 1995-02-22 | — | — | EP | claimed |
| US-5035979-A | Radiation-sensitive mixture | BASF AKTIENGESELLSCHAFT (DE) | 1991-07-30 | — | — | US | claimed |
| EP-0367131-A2 | Light-sensitive composition | BASF Aktiengesellschaft (DE) | 1990-05-09 | — | — | EP | claimed |
| US-6284438-B1 | PROVIDING SEMICONDUCTOR SUBSTRATE; FORMING MATERIAL FILM TO BE PATTERNED ON SEMICONDUCTOR SUBSTRATE; FORMING A PHOTORESIST FILM ON THE MATERIAL FILM BY COATING PHOTORESIST; PATTERNING PHOTORESIST FILM REDUCING SIZE OF OPENING BY THERMAL FLOW | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-04 | — | — | US | disclosed |
| US-6165680-A | Dissolution inhibitor of chemically amplified photoresist and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-12-26 | — | — | US | disclosed |
| US-6045970-A | A CHEMICALLY AMPLIFIED PHOTORESIST HAVING AN ACID-LABILE GROUP WHICH IS EASILY HYDROLYSIS BY AN ACIDIC CATALYST; FOR FORMING A PATTERN HAVING AN EXCELLENT PROFILE DUE TO THE HIGH CONTRAST AND HIGH THERMAL DECOMPOSITION TEMPERATURE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-04-04 | — | — | US | disclosed |
| EP-0367131-B1 | Light-sensitive composition | BASF AG (DE) | 1995-02-22 | — | — | EP | disclosed |
| US-5035979-A | Radiation-sensitive mixture | BASF AKTIENGESELLSCHAFT (DE) | 1991-07-30 | — | — | US | disclosed |
| EP-0367131-A2 | Light-sensitive composition | BASF Aktiengesellschaft (DE) | 1990-05-09 | — | — | EP | disclosed |
| EP-0129163-B1 | ARPHAMENINE AND ITS RELATED COMPOUNDS, A PROCESS FOR THEIR PREPARATION AND THEIR USE AS MEDICAMENTS | MICROBIAL CHEMISTRY RESEARCH FOUNDATION (JP) | 1987-09-16 | — | — | EP | disclosed |
| EP-0129163-A1 | Arphamenine and its related compounds, a process for their preparation and their use as medicaments | MICROBIAL CHEMISTRY RESEARCH FOUNDATION (JP) | 1984-12-27 | — | — | EP | disclosed |