SCHEMBL8014667

SCHEMBL8014667

CCCCOC(C)OC(=O)CCl

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
FAAH O00519 2/20 0.41
LMNA P02545 2/20 0.39
ALDH1A1 P00352 2/20 0.36
ATM Q13315 1/20 0.34
MAPT P10636 2/20 0.33
TSHR P16473 2/20 0.33
NAAA Q02083 1/20 0.33
DGKA P23743 1/20 0.33
THRA P10827 1/20 0.33
THRB P10828 1/20 0.33
CA1 P00915 1/20 0.33
MAPK1 P28482 1/20 0.33
HPGD P15428 1/20 0.32
ACHE P22303 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14015830 0.85 NAAA (0.44) FAAHLMNAALDH1A1ATMMAPT
SCHEMBL2306383 0.85 LMNA (0.50) LMNAALDH1A1ATMMAPTNAAA
SCHEMBL2305443 0.83 LMNA (0.58) LMNAALDH1A1MAPTTSHRDGKA
SCHEMBL2265590 0.83 LMNA (0.48) LMNAALDH1A1ATMMAPTNAAA
SCHEMBL5562346 0.81 LMNA (0.61) LMNAALDH1A1MAPTTSHRDGKA
SCHEMBL15588279 0.81 LMNA (0.52) LMNAALDH1A1MAPTTSHRNAAA
SCHEMBL10562494 0.81 LMNA (0.39) FAAHLMNAALDH1A1ATMMAPT
SCHEMBL15588278 0.81 LMNA (0.47) LMNAALDH1A1ATMMAPTDGKA
SCHEMBL11209242 0.81 LMNA (0.61) LMNAALDH1A1MAPTTSHRDGKA
SCHEMBL15588350 0.81 LMNA (0.61) LMNAALDH1A1MAPTTSHRDGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102295597-A Preparation method of triclopyr butoxyethyl ester 2011-12-28 CN claimed
CN-102295597-B Preparation method of triclopyr butoxyethyl ester MAX RUDONG CHEMICALS CO LTD 2014-01-29 CN disclosed
CN-102295597-A Preparation method of triclopyr butoxyethyl ester 2011-12-28 CN disclosed
CN-102295597-A Preparation method of triclopyr butoxyethyl ester 2011-12-28 CN disclosed
US-6030746-A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-29 US disclosed