SCHEMBL8014692

SCHEMBL8014692

CCCCOC(C)Oc1ccc(CC2CCC(C(C)(C)c3ccc(OC(C)OCCCC)cc3)CC2)cc1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ KDM4A O75164 1/20 0.32
▸ USP2 O75604 1/20 0.32
▸ ALOX15 P16050 1/20 0.32
▸ KDM4C Q9H3R0 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ HRH3 Q9Y5N1 2/20 0.32
▸ SLC6A2 P23975 1/20 0.31
▸ SLC6A4 P31645 1/20 0.31
▸ SLC6A3 Q01959 1/20 0.31
▸ CASR P41180 1/20 0.31
▸ NR1H4 Q96RI1 1/20 0.31
▸ KCNH2 Q12809 1/20 0.30
▸ TAOK1 Q7L7X3 1/20 0.30
▸ TAOK3 Q9H2K8 1/20 0.30
▸ LTA4H P09960 1/20 0.30
▸ MEN1 O00255 1/20 0.30
▸ ALDH1A1 P00352 1/20 0.30
▸ CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8006179 0.94 SLC6A2 (0.32) HRH3SLC6A2SLC6A4SLC6A3LTA4H
SCHEMBL8015408 0.90 SLC6A2 (0.33) L3MBTL1HRH3SLC6A2SLC6A4SLC6A3
SCHEMBL8015589 0.83 SLC6A2 (0.33) POLBHRH3SLC6A2SLC6A4SLC6A3
SCHEMBL8022753 0.81 SLC6A2 (0.33) SLC6A2SLC6A4SLC6A3
SCHEMBL8014689 0.79 MEN1 (0.30) KMT2AMEN1
SCHEMBL8006140 0.78 SLC6A2 (0.34) POLBKMT2AHRH3SLC6A2SLC6A4
SCHEMBL8006176 0.73 — —
SCHEMBL13439646 0.71 ALDH1A1 (0.40) HRH3ALDH1A1
SCHEMBL8006122 0.68 ELANE (0.46) POLBKMT2AL3MBTL1SLC6A2SLC6A4
SCHEMBL8015407 0.68 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6030746-A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-29 — — US disclosed
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