SCHEMBL8015407

SCHEMBL8015407

CCOC(C)Oc1ccc(C2(C)CCC(C(C)(C)c3ccc(OC(C)OCC)cc3)CC2)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8006176 0.91 — —
SCHEMBL8014689 0.90 MEN1 (0.30) —
SCHEMBL8022751 0.89 — —
SCHEMBL8015587 0.85 SLC6A2 (0.31) —
SCHEMBL8006137 0.80 — —
SCHEMBL15869181 0.78 ADORA3 (0.34) —
SCHEMBL8015408 0.77 SLC6A2 (0.33) —
SCHEMBL8017256 0.74 — —
SCHEMBL2855402 0.72 ESR2 (0.38) —
SCHEMBL1456662 0.71 LMNA (0.39) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6030746-A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-29 — — US disclosed
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