Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALPL | P05186 | 5/20 | 0.47 |
| ▸ | ALPI | P09923 | 5/20 | 0.47 |
| ▸ | SOAT1 | P35610 | 2/20 | 0.37 |
| ▸ | MRGPRX1 | Q96LB2 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4965022 | 0.95 | ALPL (0.52) | ALPLALPISOAT1ALDH1A1HTT | |
| SCHEMBL2882285 | 0.93 | ALPL (0.54) | ALPLALPISOAT1ALDH1A1HTT | |
| SCHEMBL1088213 | 0.89 | ALPL (0.40) | ALPLALPIKDM4EGAA | |
| SCHEMBL5702467 | 0.85 | KMT2A (0.44) | ALPLALPIALDH1A1MAPTHTT | |
| SCHEMBL1501702 | 0.83 | HTR1B (0.48) | GAA | |
| SCHEMBL1088018 | 0.83 | ALPL (0.46) | ALPLALPIELANE | |
| SCHEMBL3168418 | 0.82 | HTR1B (0.47) | GAACNR2 | |
| SCHEMBL10653429 | 0.81 | NPC1 (0.46) | SOAT1MRGPRX1ALDH1A1CYP1A2CYP2C19 | |
| SCHEMBL27656353 | 0.81 | ALPL (0.43) | ALPLALPIMRGPRX1ALDH1A1KDM4E | |
| SCHEMBL5702449 | 0.80 | PPARA (0.42) | ALPLALPIMRGPRX1ELANEMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5470996-A | Pattern forming material and process for forming pattern using the same | HITACHI, LTD. (JP) | 1995-11-28 | — | — | US | claimed |
| US-5118582-A | PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME | HITACHI, LTD. (JP) | 1992-06-02 | — | — | US | claimed |
| US-6030746-A | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| US-5856561-A | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0388813-B1 | Pattern forming material and process for forming pattern using the same | HITACHI LTD (JP) | 1997-12-10 | — | — | EP | disclosed |
| US-5470996-A | Pattern forming material and process for forming pattern using the same | HITACHI, LTD. (JP) | 1995-11-28 | — | — | US | disclosed |
| US-5118582-A | PATTERN FORMING MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME | HITACHI, LTD. (JP) | 1992-06-02 | — | — | US | disclosed |