SCHEMBL801671

SCHEMBL801671

CCC(C)(C)C(=O)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)O

nearest known ligand 0.43

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.43
MAPK1 P28482 1/20 0.34
MAPT P10636 1/20 0.33
HMGCR P04035 2/20 0.32
PRKCA P17252 1/20 0.31
CYP4F2 P78329 1/20 0.30
CYP4A11 Q02928 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12126256 1.00 TDP1 (0.43) TDP1MAPK1MAPTHMGCRPRKCA
SCHEMBL18104408 1.00 TDP1 (0.43) TDP1MAPK1MAPTHMGCRPRKCA
SCHEMBL16520399 0.98 TDP1 (0.44) TDP1MAPK1MAPTHMGCRPRKCA
SCHEMBL12442153 0.87 PRKCA (0.31) PRKCACYP4F2CYP4A11
SCHEMBL15613838 0.87 PRKCA (0.31) PRKCACYP4F2CYP4A11
SCHEMBL9610865 0.87 PRKCA (0.31) PRKCACYP4F2CYP4A11
SCHEMBL9923570 0.87 PRKCA (0.31) PRKCACYP4F2CYP4A11
SCHEMBL20276226 0.87 PRKCA (0.34) PRKCACYP4F2CYP4A11
SCHEMBL6380226 0.86 MAPT (0.43) TDP1MAPK1MAPTHMGCRPRKCA
SCHEMBL1426847 0.84 PRKCA (0.44) TDP1MAPK1MAPTPRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9389505-B2 Polymerizable composition for solder resist, and solder resist pattern formation method FUJIFILM CORPORATION (JP) 2016-07-12 US disclosed
US-8908293-B2 Dispersion composition, photosensitive resin composition, and solid-state image pick-up element FUJIFILM CORPORATION (JP) 2014-12-09 US disclosed
US-8766388-B2 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition FUJIFILM CORPORATION (JP) 2014-07-01 US disclosed
US-20130034812-A1 POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD FUJIFILM CORPORATION (JP) 2013-02-07 US disclosed
US-8278386-B2 Dispersion composition, polymerizable composition, light-shielding color filter, solid-state image pick-up element, liquid crystal display device, wafer level lens, and image pick-up unit FUJIFILM CORPORATION (JP) 2012-10-02 US disclosed
US-20120068292-A1 POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-03-22 US disclosed
US-20110124824-A1 DISPERSION COMPOSITION, POLYMERIZABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER, SOLID-STATE IMAGE PICK-UP ELEMENT, LIQUID CRYSTAL DISPLAY DEVICE, WAFER LEVEL LENS, AND IMAGE PICK-UP UNIT FUJIFILM CORPORATION (JP) 2011-05-26 US disclosed