SCHEMBL801862

SCHEMBL801862

CC(=CC=CN(C)CC(C)N(C)C=CC=C(C)S(=O)(=O)c1ccccc1)S(=O)(=O)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.35
▸ TP53 P04637 2/20 0.35
▸ HTT P42858 2/20 0.35
▸ HSD17B10 Q99714 1/20 0.35
▸ CCR5 P51681 1/20 0.32
▸ KDM4E B2RXH2 1/20 0.32
▸ KMT2A Q03164 4/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ SMN1; SMN2 Q16637 4/20 0.32
▸ MAPT P10636 2/20 0.32
▸ GAA P10253 1/20 0.32
▸ RAB9A P51151 2/20 0.31
▸ ATM Q13315 2/20 0.31
▸ LMNA P02545 2/20 0.31
▸ NPC1 O15118 1/20 0.31
▸ S1PR2 O95136 1/20 0.31
▸ PRNP P04156 1/20 0.31
▸ XBP1 P17861 1/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13301540 0.81 ALDH1A1 (0.40) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL801342 0.74 ALDH1A1 (0.41) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL26236689 0.70 ALDH1A1 (0.42) ALDH1A1TP53HTTHSD17B10KDM4E
SCHEMBL18601844 0.66 ALDH1A1 (0.43) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL19392608 0.65 ALDH1A1 (0.53) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL27621523 0.63 ALDH1A1 (0.47) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL13609928 0.63 ALDH1A1 (0.42) ALDH1A1TP53HTTHSD17B10KDM4E
SCHEMBL14139362 0.62 HSD11B1 (0.41) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL12101247 0.62 ALDH1A1 (0.42) ALDH1A1TP53HTTHSD17B10KMT2A
SCHEMBL20707153 0.62 ALDH1A1 (0.48) ALDH1A1TP53HTTHSD17B10KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9389507-B2 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition FUJIFILM CORPORATION (JP) 2016-07-12 — — US disclosed
US-20140255846-A1 POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2014-09-11 — — US disclosed
US-8766388-B2 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition FUJIFILM CORPORATION (JP) 2014-07-01 — — US disclosed
US-8728712-B2 Polymerizable composition FUJIFILM CORPORATION (JP) 2014-05-20 — — US disclosed
US-20130143164-A1 POLYMERIZABLE COMPOSITION FUJIFILM CORPORATION (JP) 2013-06-06 — — US disclosed
US-20120068292-A1 POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-03-22 — — US disclosed
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