SCHEMBL8029438

SCHEMBL8029438

NCCCC[SiH2]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10702888 0.97
SCHEMBL183519 0.94
SCHEMBL8027814 0.79
Acetic Acid SCHEMBL6140670 0.79 PAOX (0.37)
SCHEMBL30052527 0.77 NFKB1 (0.44)
SCHEMBL322750 0.75 CA12 (0.48)
SCHEMBL9388507 0.74
SCHEMBL1372833 0.74
SCHEMBL461329 0.72
SCHEMBL9706788 0.72 NFKB1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0647886-A1 Polyesteramide-siloxane toner and developer compositions XEROX CORPORATION (US) 1995-04-12 EP claimed
CN-113166413-B Polyimide resin composition and polyimide film 三菱瓦斯化学株式会社 2024-02-09 CN disclosed
CN-110637256-B Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern forming method 三菱瓦斯化学株式会社 2024-01-09 CN disclosed
CN-114450351-A Thermosetting resin composition, thermosetting resin sheet, electronic component, and electronic device 东丽株式会社 2022-05-06 CN disclosed
EP-3344592-B1 ANTIMICROBIAL-ANTIREFLECTIVE ARTICLES AND METHODS FOR MAKING THE SAME CORNING INC (US) 2022-04-27 EP disclosed
CN-114364747-A Polyimide resin composition, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2022-04-15 CN disclosed
WO-2022059716-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE 昭和電工マテリアルズ株式会社 2022-03-24 WO disclosed
CN-113166411-A Polyimide resin, polyimide varnish, and polyimide film 三菱瓦斯化学株式会社 2021-07-23 CN disclosed
CN-113166413-A Polyimide resin composition and polyimide film 三菱瓦斯化学株式会社 2021-07-23 CN disclosed
CN-113166415-A Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method 三菱瓦斯化学株式会社 2021-07-23 CN disclosed
EP-0647886-B1 Polyesteramide-siloxane toner and developer compositions XEROX CORP (US) 2000-02-23 EP disclosed
EP-0749469-A1 FABRIC SOFTENER COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1996-12-27 EP disclosed
WO-1995024460-A1 FABRIC SOFTENER COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1995-09-14 WO disclosed
EP-0647886-A1 Polyesteramide-siloxane toner and developer compositions XEROX CORPORATION (US) 1995-04-12 EP disclosed
US-5401601-A Polyesteramide-siloxane toner and developer compositions XEROX CORPORATION (US) 1995-03-28 US disclosed
US-5106751-A Apparatus for supporting a biochemical sensor responsive to bubbles BIOTRONIC SYSTEMS CORPORATION (US) 1992-04-21 US disclosed
WO-1990013993-A2 APPARATUS FOR SUPPORTING A BIOCHEMICAL SENSOR RESPONSIVE TO BUBBLES BIOTRONIC SYSTEMS CORPORATION (US) 1990-11-29 WO disclosed
EP-0114482-B1 A PHOTOSENSITIVE COMPOSITION FOR ELECTROPHOTOGRAPHY MITA INDUSTRIAL CO. LTD. (JP) 1988-09-14 EP disclosed
US-4574114-A Photosensitive composition for electrophotography having polyvinyl carbazole and silicone oil MITA INDUSTRIAL COMPANY, LTD. (JP) 1986-03-04 US disclosed
EP-0114482-A2 A photosensitive composition for electrophotography MITA INDUSTRIAL CO. LTD. (JP) 1984-08-01 EP disclosed