Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.37 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | XBP1 | P17861 | 1/20 | 0.37 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL777132 | 0.79 | TRPA1 (0.38) | TRPA1NPC1S1PR2S1PR4ALDH1A1 | |
| SCHEMBL28029664 | 0.79 | TRPA1 (0.42) | TRPA1NPC1S1PR2S1PR4ALDH1A1 | |
| SCHEMBL27270867 | 0.79 | TRPA1 (0.42) | TRPA1NPC1S1PR2S1PR4ALDH1A1 | |
| SCHEMBL93751 | 0.74 | — | — | |
| SCHEMBL6481787 | 0.74 | — | — | |
| SCHEMBL3627580 | 0.74 | — | — | |
| SCHEMBL93753 | 0.74 | — | — | |
| SCHEMBL6481571 | 0.74 | — | — | |
| SCHEMBL731323 | 0.71 | TRPA1 (0.56) | TRPA1ALDH1A1MAPK1 | |
| SCHEMBL21831066 | 0.71 | TRPA1 (0.56) | TRPA1ALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6103866-A | X-RAY SENSITIVE POLY(1,3-HEXADIENE SULFONE) HAVING HIGHER GLASS TRANSITION TEMPERATURE | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 2000-08-15 | — | — | US | claimed |
| US-5922518-A | EXPOSING THE PHOTORESIST COMPRISING POLY(DIENE SULFONE) TO COLLIMATED X-RAY RADIATION IN A PATTERN CORRESPONDING TO MICROSTRUCTURE AND DEVELOPING THE RESIST WITH NITROALKANE OR NITROCYCLOALKANE TO REMOVE RADIATION EXPOSED PORTION | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 1999-07-13 | — | — | US | claimed |
| US-5846727-A | Microsystem for rapid DNA sequencing | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL & MECHANICAL COLLEGE (US) | 1998-12-08 | — | — | US | claimed |
| EP-0530204-B1 | DISPERSANT COMPOSITIONS FOR SUBTERRANEAN WELL DRILLING AND COMPLETION | ATLANTIC RICHFIELD CO (US) | 1996-07-17 | — | — | EP | claimed |
| US-6103866-A | X-RAY SENSITIVE POLY(1,3-HEXADIENE SULFONE) HAVING HIGHER GLASS TRANSITION TEMPERATURE | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 2000-08-15 | — | — | US | disclosed |
| US-6103866-A | X-RAY SENSITIVE POLY(1,3-HEXADIENE SULFONE) HAVING HIGHER GLASS TRANSITION TEMPERATURE | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 2000-08-15 | — | — | US | disclosed |
| US-5922518-A | EXPOSING THE PHOTORESIST COMPRISING POLY(DIENE SULFONE) TO COLLIMATED X-RAY RADIATION IN A PATTERN CORRESPONDING TO MICROSTRUCTURE AND DEVELOPING THE RESIST WITH NITROALKANE OR NITROCYCLOALKANE TO REMOVE RADIATION EXPOSED PORTION | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 1999-07-13 | — | — | US | disclosed |
| US-5922518-A | EXPOSING THE PHOTORESIST COMPRISING POLY(DIENE SULFONE) TO COLLIMATED X-RAY RADIATION IN A PATTERN CORRESPONDING TO MICROSTRUCTURE AND DEVELOPING THE RESIST WITH NITROALKANE OR NITROCYCLOALKANE TO REMOVE RADIATION EXPOSED PORTION | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 1999-07-13 | — | — | US | disclosed |
| US-5846727-A | Microsystem for rapid DNA sequencing | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL & MECHANICAL COLLEGE (US) | 1998-12-08 | — | — | US | disclosed |