SCHEMBL8041510

SCHEMBL8041510

O=C(Cc1cc(CC(=O)c2ccc(O)c(O)c2O)cc(CC(=O)c2ccc(O)c(O)c2O)c1)c1ccc(O)c(O)c1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PIK3CA P42336 5/20 0.68
SELL P14151 1/20 0.54
SELP P16109 1/20 0.54
ESR2 Q92731 2/20 0.52
ESR1 P03372 1/20 0.52
SHBG P04278 1/20 0.52
MAPT P10636 5/20 0.51
LMNA P02545 4/20 0.51
KDM4E B2RXH2 2/20 0.51
ALDH1A1 P00352 2/20 0.51
POLB P06746 2/20 0.51
MPI P34949 2/20 0.51
RECQL P46063 2/20 0.51
GAA P10253 2/20 0.51
RAB9A P51151 2/20 0.51
HPGD P15428 2/20 0.51
NR4A1 P22736 1/20 0.51
HDAC1 Q13547 1/20 0.50
TLR2 O60603 1/20 0.49
NSD2 O96028 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6847306 0.89 PIK3CA (0.82) PIK3CASELLSELPESR2ESR1
SCHEMBL3459589 0.84 PIK3CA (0.69) PIK3CASELLSELPESR2ESR1
SCHEMBL27700015 0.84 PIK3CA (0.74) PIK3CASELLSELPESR2ESR1
SCHEMBL29457583 0.84 PIK3CA (0.69) PIK3CASELLSELPESR2ESR1
SCHEMBL27666164 0.82 PIK3CA (0.67) PIK3CASELLSELPESR2ESR1
SCHEMBL8703963 0.81 PIK3CA (0.70) PIK3CASELLSELPESR2ESR1
SCHEMBL32667709 0.81 PIK3CA (0.70) PIK3CASELLSELPESR2ESR1
SCHEMBL10558859 0.81 PIK3CA (0.70) PIK3CASELLSELPESR2ESR1
SCHEMBL3658145 0.80 SELL (0.60) PIK3CASELLSELPESR2MAPT
SCHEMBL10561645 0.79 PIK3CA (0.68) PIK3CAESR2SHBGMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0658807-B1 Positive-working photoresist composition FUJI PHOTO FILM CO LTD (JP) 2000-04-05 EP disclosed
EP-0886183-A1 Positive-working photoresist composition Fuji Photo Film Co., Ltd. (JP) 1998-12-23 EP disclosed
US-5609982-A Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1997-03-11 US disclosed
EP-0658807-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-06-21 EP disclosed