SCHEMBL3658145

SCHEMBL3658145

O=C(CC(=O)c1ccc(O)c(O)c1O)c1ccc(O)c(O)c1O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SELL P14151 1/20 0.60
SELP P16109 1/20 0.60
PIK3CA P42336 5/20 0.58
HDAC1 Q13547 1/20 0.50
MAPT P10636 4/20 0.45
KDM4E B2RXH2 3/20 0.45
ALDH1A1 P00352 3/20 0.45
RECQL P46063 3/20 0.45
POLB P06746 2/20 0.45
MPI P34949 2/20 0.45
TLR2 O60603 1/20 0.45
NSD2 O96028 1/20 0.45
PKM P14618 1/20 0.45
GRK6 P43250 1/20 0.45
TLR1 Q15399 1/20 0.45
TLR6 Q9Y2C9 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
HPGD P15428 2/20 0.44
RAB9A P51151 2/20 0.44
LMNA P02545 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6847306 0.82 PIK3CA (0.82) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL11419973 0.82 SELL (0.56) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL15673064 0.82 SELL (0.56) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL2986601 0.82 HSP90AB1 (0.57) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL8041510 0.80 PIK3CA (0.68) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL7773826 0.80 SELL (0.54) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL29557383 0.79 ALDH1A1 (0.59) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL9313474 0.79 SELL (0.58) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL4213430 0.79 ALDH1A1 (0.59) SELLSELPPIK3CAHDAC1MAPT
SCHEMBL63797 0.79 ALDH1A1 (0.55) SELLSELPPIK3CAHDAC1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 175 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP claimed
WO-2009040661-A2 THICK FILM RESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-02 WO claimed
US-20090081589-A1 THICK FILM RESISTS MERCK PATENT GMBH (DE) 2009-03-26 US claimed
EP-4702010-A1 PHOTOACTIVE COMPOUNDS Merck Patent GmbH (DE) 2026-03-04 EP disclosed
US-20250376552-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2025-12-11 US disclosed
US-20250264801-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-08-21 US disclosed
EP-4596607-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-4597225-A1 FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-4596608-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
US-20250236697-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-07-24 US disclosed
US-20250230283-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-07-17 US disclosed
EP-0445680-A2 Positive type photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-09-11 EP disclosed
EP-0443820-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-08-28 EP disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed
EP-0410760-A2 Light-sensitive compositions FUJI PHOTO FILM CO., LTD. (JP) 1991-01-30 EP disclosed
EP-0395049-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1990-10-31 EP disclosed
EP-0385442-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1990-09-05 EP disclosed
EP-0365318-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-04-25 EP disclosed
US-4883739-A PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1989-11-28 US disclosed
EP-0307951-A2 Light-sensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1989-03-22 EP disclosed