Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 5/20 | 0.40 |
| ▸ | MMP9 | P14780 | 5/20 | 0.40 |
| ▸ | MMP8 | P22894 | 3/20 | 0.40 |
| ▸ | MMP13 | P45452 | 3/20 | 0.40 |
| ▸ | MMP3 | P08254 | 2/20 | 0.40 |
| ▸ | OPRK1 | P41145 | 2/20 | 0.39 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.39 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.39 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.39 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.36 |
| ▸ | LTA4H | P09960 | 2/20 | 0.36 |
| ▸ | MLNR | O43193 | 1/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.35 |
| ▸ | PGR | P06401 | 1/20 | 0.35 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.35 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.35 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11592255 | 1.00 | MMP2 (0.40) | MMP2MMP9MMP8MMP13MMP3 | |
| Methyl Alcohol SCHEMBL11123438 | 0.81 | MMP2 (0.42) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL5416450 | 0.81 | MMP2 (0.44) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL11499462 | 0.81 | MMP2 (0.44) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL7721179 | 0.81 | MMP2 (0.44) | MMP2MMP9MMP8MMP13MMP3 | |
| Alcohol SCHEMBL8073598 | 0.80 | MMP2 (0.41) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL287632 | 0.78 | MMP2 (0.42) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL1878427 | 0.78 | MMP2 (0.42) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL289725 | 0.78 | MMP2 (0.42) | MMP2MMP9MMP8MMP13MMP3 | |
| SCHEMBL498620 | 0.78 | MMP2 (0.42) | MMP2MMP9MMP8MMP13MMP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6140026-A | POSITIVE PATTERN IMAGES ON SUBSTRATES, COATING A BINDER RESIN WITH PHOTOSENSITIVE COMPOUND OF O-QUINONEDIAZIDESULFONIC ACID OF PHENOL | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-10-31 | — | — | US | disclosed |
| US-5399456-A | Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound | HOECHST CELANESE CORPORATION (US) | 1995-03-21 | — | — | US | disclosed |
| EP-0405957-B1 | Deep U.V. photoresist compositions containing polycyclic cyclopentane -2- diazo-1,3-dione | HOECHST CELANESE CORP (US) | 1995-01-11 | — | — | EP | disclosed |
| US-5256522-A | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1993-10-26 | — | — | US | disclosed |
| US-5217840-A | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom | HOECHST CELANESE CORPORATION (US) | 1993-06-08 | — | — | US | disclosed |
| US-5182185-A | Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions | HOECHST CELANESE CORPORATION (US) | 1993-01-26 | — | — | US | disclosed |
| EP-0459708-A2 | Image reversal negative working photoresist | HOECHST CELANESE CORPORATION (US) | 1991-12-04 | — | — | EP | disclosed |
| US-5039596-A | Photosensitizers | HOECHST CELANESE CORPORATION (US) | 1991-08-13 | — | — | US | disclosed |
| US-5019488-A | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | HOECHST CELANESE CORPORATION (US) | 1991-05-28 | — | — | US | disclosed |
| EP-0405957-A1 | Deep U.V. photoresist compositions containing polycyclic cyclopentane -2- diazo-1,3-dione | HOECHST CELANESE CORPORATION (US) | 1991-01-02 | — | — | EP | disclosed |
| US-4931381-A | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment | HOECHST CELANESE CORPORATION (US) | 1990-06-05 | — | — | US | disclosed |
| US-4929536-A | Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1990-05-29 | — | — | US | disclosed |
| EP-0361906-A2 | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | HOECHST CELANESE CORPORATION (US) | 1990-04-04 | — | — | EP | disclosed |
| US-4914170-A | POLYMERIZING MIXTURE OF ACRYLIC ACID AND HYDROPHILIC MONOMER | ROHM AND HAAS COMPANY (US) | 1990-04-03 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0327991-A2 | Radiation sensitive recording material comprising a polysulfone barrier layer | HOECHST CELANESE CORPORATION (US) | 1989-08-16 | — | — | EP | disclosed |
| US-4835086-A | Polysulfone barrier layer for bi-level photoresists | HOECHST CELANESE CORPORATION (US) | 1989-05-30 | — | — | US | disclosed |
| EP-0317138-A2 | Superabsorbent polymeric compositions and processes for producing them | ROHM AND HAAS COMPANY (US) | 1989-05-24 | — | — | EP | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |