Sugi Predict

Sugi Predict / Compounds / SCHEMBL8045369

SCHEMBL8045369

SCHEMBL8045369

Sc1nnc(Nc2ccccc2)s1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 8/20 0.51
▸ NPC1 O15118 7/20 0.51
▸ SMN1; SMN2 Q16637 7/20 0.51
▸ ALOX15 P16050 1/20 0.51
▸ KMT2A Q03164 7/20 0.50
▸ MEN1 O00255 6/20 0.50
▸ ALDH1A1 P00352 6/20 0.49
▸ TP53 P04637 2/20 0.49
▸ HPGD P15428 1/20 0.47
▸ MAPT P10636 4/20 0.46
▸ GAA P10253 4/20 0.46
▸ CASP3 P42574 1/20 0.46
▸ SENP8 Q96LD8 1/20 0.46
▸ SENP7 Q9BQF6 1/20 0.46
▸ SENP6 Q9GZR1 1/20 0.46
▸ KDR P35968 1/20 0.44
▸ KDM4E B2RXH2 1/20 0.44
▸ GFER P55789 1/20 0.44
▸ APOBEC3G Q9HC16 1/20 0.44
▸ TDP1 Q9NUW8 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11666704 0.85 RAB9A (0.59) RAB9ANPC1SMN1; SMN2ALOX15KMT2A
SCHEMBL23220335 0.81 NPC1 (0.64) RAB9ANPC1SMN1; SMN2ALOX15KMT2A
SCHEMBL8032721 0.81 SMN1; SMN2 (0.55) RAB9ANPC1SMN1; SMN2KMT2AMEN1
SCHEMBL27876956 0.81 MAPT (0.51) RAB9ANPC1SMN1; SMN2KMT2AMEN1
SCHEMBL28365690 0.79 RAB9A (0.49) RAB9ANPC1SMN1; SMN2KMT2AMEN1
SCHEMBL27860373 0.79 CCNA2 (0.43) RAB9ANPC1SMN1; SMN2KMT2AMEN1
SCHEMBL27860210 0.79 GAA (0.52) RAB9ANPC1SMN1; SMN2KMT2AMEN1
SCHEMBL5157724 0.76 SCN9A (0.57) RAB9ANPC1SMN1; SMN2ALOX15KMT2A
SCHEMBL23220354 0.76 RAB9A (0.58) RAB9ANPC1SMN1; SMN2ALOX15KMT2A
SCHEMBL12015939 0.76 NPC1 (0.73) RAB9ANPC1SMN1; SMN2ALOX15KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10988854-B2 Flexible color adjustment for dark Cr(III) platings MACDERMID ENTHONE INC. (US) 2021-04-27 — — US claimed
CN-108290382-B Flexible color tuning for dark Cr (III) plating 麦克德米德乐思公司 2021-01-15 — — CN claimed
US-20200141022-A1 FLEXIBLE COLOR ADJUSTMENT FOR DARK Cr(III) PLATINGS MACDERMID ENTHONE INC. (US) 2020-05-07 — — US claimed
US-10544516-B2 Flexible color adjustment for dark Cr(III) platings MACDERMID ENTHONE INC. (US) 2020-01-28 — — US claimed
US-20180266008-A1 Flexible Color Adjustment for Dark Cr(III) Platings CITIBANK, N.A. 2018-09-20 — — US claimed
EP-3147388-A1 FLEXIBLE COLOR ADJUSTMENT FOR DARK CR(III)-PLATINGS ENTHONE, INCORPORATED (US) 2017-03-29 — — EP claimed
US-20230004085-A1 METHOD FOR MANUFACTURING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PREMIX SOLUTION FOR PREPARING CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, METHOD FOR MANUFACTURING PHOTOSENSITIVE DRY FILM, AND METHOD FOR MANUFACTURING PATTERNED RESIST FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-05 — — US disclosed
US-11543749-B2 Resist composition and method for producing resist pattern, and method for producing plated molded article SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-01-03 — — US disclosed
US-20210278765-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-09-09 — — US disclosed
US-10988854-B2 Flexible color adjustment for dark Cr(III) platings MACDERMID ENTHONE INC. (US) 2021-04-27 — — US disclosed
US-10969685-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-04-06 — — US disclosed
CN-108290382-B Flexible color tuning for dark Cr (III) plating 麦克德米德乐思公司 2021-01-15 — — CN disclosed
US-20200209749-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-07-02 — — US disclosed
US-20150086927-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-03-26 — — US disclosed
CN-102532126-B 2-substituted-4-chloro-5-[5-subtsituted amino-2-(1,3,4-thiadiazole)-sulfydryl]-3(2H)- pyridazinone derivatives, and preparation method and application thereof UNIV GUIZHOU 2014-06-18 — — CN disclosed
CN-102532126-A 2-substituted-4-chloro-5-[5-subtsituted amino-2-(1,3,4-thiadiazole)-sulfydryl]-3(2H)- pyridazinone derivatives, and preparation method and application thereof UNIV GUIZHOU 2012-07-04 — — CN disclosed
US-6143765-A ENZYME IHIBITORS OF PROTEIN SUGEN, INC. (US) 2000-11-07 — — US disclosed
US-6080772-A 2-AMINOTHIAZOLE TRIAZOLE OR TETRAZOLE COMPOUND FOR REGULATING PROTEIN TYROSINE PHOSPHATASE ACTIVITY SUGEN, INC. (US) 2000-06-27 — — US disclosed
US-5883110-A ORGANIC MOLECULES CAPABLE OF INHIBITING PROTEIN TYROSINE PHOSPHATASE ACTIVITY, AND THE USE OF SUCH MOLECULES TO TREAT VARIOUS DISEASE STATES INCLUDING DIABETES MELLITUS, GLIOMA, MELANOMA, KAPOSI'S SARCOMA, HEMANGIOMA, OVARIAN CANCER, BREAST SUGEN, INC. (US) 1999-03-16 — — US disclosed
US-4492793-A Process for the production of 2-amino-5-mercapto-1,3,4-thiadiazole DEGUSSA AKTIENGESELLSCHAFT (DE) 1985-01-08 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200209749-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN HACL2, NEK10, ACAD10 RAB9A 3707/4885NPC1 4569/4885SMN1; SMN2 4049/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.