SCHEMBL8045932

SCHEMBL8045932

Cc1ccc(C)c(C(C)[O])c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.45
KMT2A Q03164 3/20 0.44
ALDH1A1 P00352 2/20 0.44
MEN1 O00255 2/20 0.44
TDP1 Q9NUW8 2/20 0.41
TRPA1 O75762 1/20 0.40
CHRM1 P11229 1/20 0.40
SLC6A2 P23975 1/20 0.40
ADRA1A P35348 1/20 0.40
HTR2B P41595 1/20 0.40
HSD11B1 P28845 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37
HSD17B10 Q99714 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2A6 P11509 1/20 0.36
TP53 P04637 1/20 0.36
POLB P06746 1/20 0.36
ELANE P08246 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11863314 0.81 LMNA (0.41) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL16308853 0.81 LMNA (0.41) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL8036411 0.81 LMNA (0.45) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL16308862 0.81 LMNA (0.41) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL16308856 0.81 LMNA (0.41) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL598624 0.80 LMNA (0.54) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL30165955 0.80 LMNA (0.54) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL11882816 0.80 ALDH1A1 (0.44) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL11616021 0.78 TDP1 (0.42) LMNAKMT2AALDH1A1MEN1TDP1
SCHEMBL30033057 0.78 TDP1 (0.42) LMNAKMT2AALDH1A1MEN1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed