SCHEMBL8046905

SCHEMBL8046905

CCCCCCCCCCCCCCCCCC(=O)Oc1ccc(S(=O)(=O)c2ccccc2)cc1S(=O)(=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
KDM4E B2RXH2 1/20 0.46
RECQL P46063 1/20 0.46
ALOX15 P16050 1/20 0.45
TOP2A P11388 2/20 0.45
POLM Q9NP87 1/20 0.43
POLK Q9UBT6 1/20 0.43
POLL Q9UGP5 1/20 0.43
POLH Q9Y253 1/20 0.43
AKR1C3 P42330 1/20 0.42
AKR1C2 P52895 1/20 0.42
CTRC Q99895 1/20 0.42
S1PR3 Q99500 1/20 0.41
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
PTGS2 P35354 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7185277 0.79 S1PR3 (0.52) MEN1KMT2AKDM4ERECQLALOX15
SCHEMBL7185271 0.79 ALOX15 (0.48) MEN1KMT2AKDM4ERECQLALOX15
SCHEMBL8046875 0.78 ABCB1 (0.48) S1PR3
SCHEMBL15970589 0.77 KMT2A (0.52) MEN1KMT2AKDM4ERECQLALOX15
SCHEMBL15970342 0.77 KMT2A (0.52) MEN1KMT2AKDM4ERECQLALOX15
Benzene SCHEMBL11158596 0.77 KDM4E (0.56) MEN1KMT2AKDM4ERECQLALOX15
SCHEMBL6332002 0.77 KMT2A (0.52) MEN1KMT2AKDM4ERECQLALOX15
SCHEMBL11772385 0.76 KMT2A (0.57) KMT2APTGS2
SCHEMBL727223 0.76 MEN1 (0.51) MEN1KMT2AKDM4ERECQLALOX15
SCHEMBL8334538 0.76 MEN1 (0.51) MEN1KMT2AKDM4ERECQLALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed