SCHEMBL8047372

SCHEMBL8047372

CCCCOc1ccccc1CC[O]

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.53
CYP2C9 P11712 1/20 0.53
CYP2C19 P33261 1/20 0.53
L3MBTL1 Q9Y468 3/20 0.53
MAPT P10636 3/20 0.53
HPGD P15428 1/20 0.53
ATM Q13315 1/20 0.53
PPARD Q03181 1/20 0.52
NPSR1 Q6W5P4 1/20 0.51
CSNK1A1 P48729 1/20 0.50
CSNK1D P48730 1/20 0.50
PRKCD Q05655 1/20 0.50
PAK1 Q13153 1/20 0.50
CAMK2B Q13554 1/20 0.50
CAMK2G Q13555 1/20 0.50
CAMK2D Q13557 1/20 0.50
TAOK1 Q7L7X3 1/20 0.50
ALDH1A1 P00352 1/20 0.48
TSHR P16473 1/20 0.48
LTB4R Q15722 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8036227 0.91 L3MBTL1 (0.53) L3MBTL1MAPTHPGDATMPPARD
SCHEMBL919038 0.87 CYP1A2 (0.58) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL7999552 0.87 PPARD (0.60) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL7198896 0.86 THRB (0.51) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL8036343 0.85 CYP1A2 (0.56) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL9689273 0.85 L3MBTL1 (0.69) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL8521939 0.85 THRB (0.54) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL10626121 0.85 THRB (0.54) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL10625676 0.85 THRB (0.54) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT
SCHEMBL10629984 0.85 THRB (0.54) CYP1A2CYP2C9CYP2C19L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed