SCHEMBL8048419

SCHEMBL8048419

CC(C)COc1ccc(C[O])cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.49
MEN1 O00255 1/20 0.49
ALOX12 P18054 1/20 0.49
KMT2A Q03164 1/20 0.49
ACACB O00763 7/20 0.48
ALDH1A1 P00352 3/20 0.47
NPSR1 Q6W5P4 1/20 0.47
LMNA P02545 2/20 0.46
NR1H4 Q96RI1 1/20 0.45
HPGD P15428 3/20 0.45
POLB P06746 2/20 0.45
XBP1 P17861 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.44
KDM4E B2RXH2 2/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
TARBP2 Q15633 1/20 0.43
NPC1 O15118 2/20 0.42
TSHR P16473 1/20 0.42
RAB9A P51151 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20780568 0.86 ACACB (0.50) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL123415 0.84 MAPT (0.55) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL8047271 0.84 ACACB (0.52) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL15114294 0.83 LMNA (0.57) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL13155583 0.81 ACACB (0.53) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL4527180 0.81 MAPT (0.50) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL7477540 0.81 NPC1 (0.54) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL20175352 0.80 ACACB (0.46) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL969120 0.79 MAOB (0.52) MAPTMEN1ALOX12KMT2AACACB
SCHEMBL8048422 0.79 MAPT (0.53) MAPTMEN1ALOX12KMT2AACACB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed