SCHEMBL8057437

SCHEMBL8057437

O=S(=O)(O)c1ccc(S(=O)(=O)c2ccccc2)cc1S(=O)(=O)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 4/20 0.52
SMN1; SMN2 Q16637 3/20 0.48
TSHR P16473 2/20 0.48
POLB P06746 2/20 0.47
GAA P10253 1/20 0.47
GFER P55789 1/20 0.47
ALDH1A1 P00352 3/20 0.46
MAPT P10636 1/20 0.46
KIF18A Q8NI77 1/20 0.44
NPSR1 Q6W5P4 2/20 0.44
HSD11B1 P28845 1/20 0.44
LMNA P02545 1/20 0.44
THRB P10828 1/20 0.44
KMT2A Q03164 1/20 0.43
HTR2C P28335 2/20 0.42
HTR2B P41595 1/20 0.42
HTR2A P28223 1/20 0.42
KCNH2 Q12809 1/20 0.42
SFRP1 Q8N474 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7642124 0.94 HTR6 (0.54) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL8429342 0.92 GAA (0.50) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL8046886 0.83 HTR6 (0.45) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL1516456 0.82 TSHR (0.58) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL29121431 0.80 TSHR (0.56) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL28881125 0.80 TSHR (0.56) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL28132945 0.80 TSHR (0.56) HTR6SMN1; SMN2TSHRPOLBGAA
SCHEMBL27208994 0.79 POLB (0.58) HTR6SMN1; SMN2POLBGAAGFER
SCHEMBL660467 0.79 GAA (0.73) HTR6SMN1; SMN2POLBGAAGFER
SCHEMBL6534882 0.79 GAA (0.73) HTR6SMN1; SMN2POLBGAAGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed