Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL8065002

CCCCCCCCCCCCC(CCCCCCCCCCCC)(CCCCCCCCCCCC)OC(C)=O.N

nearest known ligand 0.42

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Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.42
MEN1 O00255 1/20 0.42
MAPT P10636 1/20 0.42
KMT2A Q03164 1/20 0.42
ATM Q13315 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
GGPS1 O95749 5/20 0.41
ALDH1A1 P00352 1/20 0.40
SMPD1 P17405 1/20 0.40
FDPS P14324 7/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL2204884 1.00 CES2 (0.42) CES2MEN1MAPTKMT2AATM
Phosphine SCHEMBL1535955 0.96 CES2 (0.42) CES2MEN1MAPTKMT2AATM
Phosphine SCHEMBL7158535 0.96 CES2 (0.42) CES2MEN1MAPTKMT2AATM
Ammonia Solution, Strong SCHEMBL29115109 0.91 ALDH1A1 (0.43) CES2MEN1MAPTKMT2AATM
SCHEMBL28535595 0.90 ALDH1A1 (0.39) CES2MEN1MAPTKMT2AATM
SCHEMBL12776896 0.89 ALDH1A1 (0.44) CES2MEN1MAPTKMT2AATM
SCHEMBL7528968 0.88 ALDH1A1 (0.40) CES2MEN1MAPTKMT2AATM
Ammonia Solution, Strong SCHEMBL9224614 0.86 GAA (0.42) CES2MEN1MAPTKMT2AATM
Ammonia Solution, Strong SCHEMBL11314488 0.86 GAA (0.42) CES2MEN1MAPTKMT2AATM
SCHEMBL12776897 0.85 ALDH1A1 (0.41) CES2MEN1MAPTKMT2AATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119998417-A Emulsion composition of film-forming organopolysiloxane and method for producing same 信越化学工业株式会社 2025-05-13 CN disclosed
CN-114787282-B Cationic emulsion composition of polyorganosiloxane and preparation method thereof 信越化学工业株式会社 2024-12-03 CN disclosed
US-6040009-A SOLVENTS, POLYESTER RESIN, STAR OLIGOMER AND CURING AGENTS MAZDA MOTOR CORPORATION (JP) 2000-03-21 US disclosed
EP-0688841-A2 Low solvent content type-resin composition, coating composition containing such resin composition and process for coating such coating composition MAZDA MOTOR CORPORATION (JP) 1995-12-27 EP disclosed