SCHEMBL8065781

SCHEMBL8065781

N=[N+]=C1c2ccccc2-c2cccc(S(=O)(=O)O)c21

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PGAM1 P18669 1/20 0.38
TTR P02766 2/20 0.36
ALDH1A1 P00352 3/20 0.35
MAPT P10636 2/20 0.35
LMNA P02545 1/20 0.35
GNG2 P59768 4/20 0.35
GNB1 P62873 4/20 0.35
MYC P01106 1/20 0.34
DAPK1 P53355 1/20 0.34
CHAT P28329 1/20 0.34
SNCA P37840 1/20 0.34
P2RY4 P51582 1/20 0.33
FABP4 P15090 1/20 0.33
CCNA2 P20248 1/20 0.33
CDK2 P24941 1/20 0.33
MAPK14 Q16539 1/20 0.33
STAT3 P40763 1/20 0.33
CYP1A2 P05177 2/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8065777 0.83 PGAM1 (0.38) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL29945057 0.81 PGAM1 (0.44) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL4875071 0.81 PGAM1 (0.44) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL24631331 0.79 TTR (0.47) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL9763220 0.78 MAPT (0.52) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL8076779 0.76 AURKA (0.39) PGAM1MAPTLMNADAPK1MAPK1
SCHEMBL24631333 0.75 TTR (0.47) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL28804762 0.72 ALDH1A1 (0.50) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL27661265 0.72 ALDH1A1 (0.50) PGAM1TTRALDH1A1MAPTLMNA
SCHEMBL1270794 0.71 STAT3 (0.58) PGAM1TTRALDH1A1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed