⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28657496 | 0.81 | — | — | |
| SCHEMBL28081632 | 0.76 | — | — | |
| SCHEMBL28805239 | 0.73 | — | — | |
| SCHEMBL9223000 | 0.68 | SLC18A3 (0.38) | — | |
| SCHEMBL30448716 | 0.68 | LMNA (0.36) | — | |
| SCHEMBL31408912 | 0.68 | — | — | |
| Propionaldehyde SCHEMBL1072724 | 0.68 | ALDH1A1 (0.33) | — | |
| SCHEMBL27586478 | 0.66 | CYP3A4 (0.30) | — | |
| SCHEMBL5326186 | 0.65 | — | — | |
| SCHEMBL20582547 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9062246-B2 | Fluorescent compound, making method, and fluorescent resin composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| EP-2626400-B1 | Fluorescent compound, making method, and fluorescent resin composition | SHINETSU CHEMICAL CO (JP) | 2014-10-08 | — | — | EP | disclosed |
| US-20130207041-A1 | FLUORESCENT COMPOUND, MAKING METHOD, AND FLUORESCENT RESIN COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| EP-2626400-A1 | Fluorescent compound, making method, and fluorescent resin composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-6066746-A | USING ULTRAVIOLET LIGHT | BASF AKTIENGESELLSCHAFT (DE) | 2000-05-23 | — | — | US | disclosed |
| US-6017976-A | COATING A FREE-RADICALLY POLYMERIZABLE COMPOUNDS CONTAINING AT LEAST ONE A 2,3-DIHYDROFURAN STRUCTURE COMPOUND, WHICH ARE POLYMERIZED BY CATIONIC OR FREE RADICAL POLYMERIZATION, THEN CURING WITH HIGH ENERGY LIGHT | BASF AKTIENGESELLSCHAFT (DE) | 2000-01-25 | — | — | US | disclosed |