SCHEMBL8070102

SCHEMBL8070102

CCCCC(C(=O)C(CCCC)c1ccc(O)c(O)c1O)c1ccc(O)c(O)c1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IAPP P10997 3/20 0.36
CNR2 P34972 1/20 0.36
GAA P10253 1/20 0.36
XBP1 P17861 1/20 0.36
ATM Q13315 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ELANE P08246 1/20 0.36
CTRC Q99895 1/20 0.36
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36
MAPT P10636 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
RECQL P46063 1/20 0.36
HSD17B10 Q99714 1/20 0.36
LMNA P02545 2/20 0.35
TRPV1 Q8NER1 1/20 0.34
BID P55957 1/20 0.33
BCL2L1 Q07817 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7772658 0.95 CNR2 (0.38) IAPPCNR2ATMALDH1A1MAPT
SCHEMBL8663788 0.84 GPR84 (0.42) CNR2MAPTBIDBCL2L1MCL1
SCHEMBL9620395 0.84 GPR84 (0.42) CNR2MAPTBIDBCL2L1MCL1
SCHEMBL9419226 0.78 HTT (0.47) KDM4EMAPTALOX15
SCHEMBL10707896 0.77 CYSLTR2 (0.36) ADRB2
SCHEMBL3650269 0.77 TSHR (0.35) IAPPCNR2GAAXBP1ATM
SCHEMBL9158036 0.75 TYR (0.42) CNR2
SCHEMBL7855809 0.73 HTT (0.50) KDM4EALDH1A1MAPTHPGDALOX15
SCHEMBL27890121 0.73 TSHR (0.37) IAPPGAAXBP1ATMNPSR1
SCHEMBL3657561 0.72 TYR (0.34) IAPPCNR2MAPTTRPV1ADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250376552-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2025-12-11 US disclosed
EP-4596608-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
US-20250236697-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-07-24 US disclosed
WO-2024053655-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-14 WO disclosed
WO-2024048436-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048603-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048605-A1 RESIN COMPOSITION, CURED PRODUCT, LAYERED BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAYERED BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048604-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2024048435-A1 RESIN COMPOSITION, CURED ARTICLE, LAMINATE, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2024-03-07 WO disclosed
WO-2022202647-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2022-09-29 WO disclosed
EP-0745575-B1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO LTD (JP) 2000-09-06 EP disclosed
EP-0753795-B1 Positive working photoresist composition FUJI PHOTO FILM CO LTD (JP) 1999-10-13 EP disclosed
EP-0764884-B1 Positive working photoresist composition FUJI PHOTO FILM CO LTD (JP) 1999-09-01 EP disclosed
US-5853949-A Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO., LTD. (JP) 1998-12-29 US disclosed
US-5709977-A Positive working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1998-01-20 US disclosed
US-5652081-A PHENOLIC RESIN FUJI PHOTO FILM CO., LTD. (JP) 1997-07-29 US disclosed
EP-0764884-A2 Positive working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1997-03-26 EP disclosed
EP-0753795-A1 Positive working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1997-01-15 EP disclosed
EP-0745575-A1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO., LTD. (JP) 1996-12-04 EP disclosed