⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13744538 | 0.82 | — | — | |
| SCHEMBL13744752 | 0.80 | — | — | |
| SCHEMBL13146117 | 0.76 | — | — | |
| SCHEMBL10082775 | 0.76 | — | — | |
| SCHEMBL12292438 | 0.75 | TRPA1 (0.30) | — | |
| SCHEMBL25573176 | 0.75 | — | — | |
| SCHEMBL13744289 | 0.75 | — | — | |
| SCHEMBL12968008 | 0.74 | — | — | |
| SCHEMBL11836125 | 0.73 | INPP5A (0.34) | — | |
| SCHEMBL1687665 | 0.72 | LIPA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2012036315-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-22 | — | — | WO | disclosed |
| WO-2011087144-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-21 | — | — | WO | disclosed |