SCHEMBL807041

SCHEMBL807041

CC(C)C(I)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 4/20 0.44
AOC3 Q16853 1/20 0.41
KDM4E B2RXH2 2/20 0.41
ADRA2A P08913 1/20 0.41
ADRA2C P18825 1/20 0.41
CYP2D6 P10635 1/20 0.41
LMNA P02545 1/20 0.41
HIF1A Q16665 1/20 0.41
ALDH1A1 P00352 2/20 0.39
DPP4 P27487 2/20 0.39
F2 P00734 1/20 0.39
TSHR P16473 1/20 0.39
MIF P14174 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9023354 0.83 TAAR1 (0.42) TAAR1KDM4EADRA2AADRA2CCYP2D6
SCHEMBL11721312 0.82 DPP4 (0.47) TAAR1CYP2D6LMNADPP4F2
SCHEMBL20341034 0.81 TAAR1 (0.41) TAAR1KDM4EADRA2AADRA2CCYP2D6
SCHEMBL17252635 0.81 TAAR1 (0.41) TAAR1KDM4EADRA2AADRA2CCYP2D6
SCHEMBL21120565 0.81 TAAR1 (0.41) TAAR1KDM4EADRA2AADRA2CCYP2D6
SCHEMBL28177234 0.79 ADRA2A (0.54) TAAR1AOC3KDM4EADRA2AADRA2C
SCHEMBL8062048 0.77
SCHEMBL687143 0.77
SCHEMBL3431371 0.77
SCHEMBL20055714 0.75 LMNA (0.46) TAAR1AOC3CYP2D6LMNAMIF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9959982-B2 Photoelectric conversion element and method for producing the same Konica Minolta, Inc. (JP) 2018-05-01 US disclosed
WO-2012036315-A1 METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-03-22 WO disclosed
WO-2011132764-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2011-10-27 WO disclosed
WO-2011102546-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2011-08-25 WO disclosed
WO-2009143049-A1 BICYCLIC HETEROCYCLE DERIVATIVES AND USE THEREOF AS GPR119 MODULATORS SCHERING CORPORATION (US) 2009-11-26 WO disclosed
EP-0985649-B1 Method for producing an aromatic compound having an alkyl group with at least three carbon atoms TORAY INDUSTRIES (JP) 2004-11-24 EP disclosed
US-6462248-B1 THROUGH CONVERSION, ISOMERIZATION AND/OR ADSORPTIVE SEPARATION OF AROMATIC COMPOUNDS TORAY INDUSTRIES, INC. (JP) 2002-10-08 US disclosed
EP-0985649-A2 Method for producing an aromatic compound having an alkyl group with at least three carbon atoms TORAY INDUSTRIES, INC. (JP) 2000-03-15 EP disclosed