Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 3/20 | 0.35 |
| ▸ | CA12 | O43570 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.35 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.34 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.34 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.34 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.34 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.34 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8069552 | 1.00 | KDM4E (0.36) | KDM4EALDH1A1HPGDALOX15HSD17B10 | |
| SCHEMBL66113 | 0.90 | HSD11B1 (0.38) | CA2CA1CNR2NR3C1HTR2A | |
| SCHEMBL8592504 | 0.89 | ALDH1A1 (0.43) | KDM4EALDH1A1HPGDALOX15HSD17B10 | |
| SCHEMBL64049 | 0.86 | HSD11B1 (0.41) | CNR2NR3C1MEN1KMT2ABCHE | |
| SCHEMBL63999 | 0.86 | HSD11B1 (0.41) | CNR2NR3C1MEN1KMT2ABCHE | |
| SCHEMBL8494198 | 0.85 | BCHE (0.46) | ALDH1A1CA9CA2CA1FFAR1 | |
| SCHEMBL8318837 | 0.85 | ALDH1A1 (0.38) | KDM4EALDH1A1HPGDALOX15HSD17B10 | |
| SCHEMBL8324855 | 0.85 | ALDH1A1 (0.38) | KDM4EALDH1A1HPGDALOX15HSD17B10 | |
| SCHEMBL8497205 | 0.85 | HSD11B1 (0.47) | ALDH1A1CA2CA1NPC1POLB | |
| SCHEMBL8651578 | 0.83 | HDAC3 (0.36) | KDM4EALDH1A1HPGDALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5569784-A | FINE PATTERN; PREVENTS POST-EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-10-29 | — | — | US | claimed |
| US-6106993-A | HIGHLY SENSITIVE TO ACTINIC RADIATION SUCH AS DEEP-UV, ELECTRON BEAM AND X-RAY, CAN BE DEVELOPED WITH ALKALINE AQUEOUS SOLUTION TO FORM A PATTERN, AND IS THUS SUITABLE FOR USE IN A FINE PATTERNING TECHNIQUE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| EP-0665220-B1 | Novel sulfonium salt and chemically amplified positive resist composition | SHINETSU CHEMICAL CO (JP) | 1999-04-07 | — | — | EP | disclosed |
| EP-0667338-B1 | Sulfonium salt and resist composition | SHINETSU CHEMICAL CO (JP) | 1998-01-07 | — | — | EP | disclosed |
| US-5691112-A | P-TOLUENESULFONIC ACID TRIS(P-TERT-BUTOXYPHENYL) SULFONIUM AS PHOTOSENSITIVE ACID GENERATOR; FORMING SOLUBLE SURFACE LAYER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-11-25 | — | — | US | disclosed |
| US-5633409-A | POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5569784-A | FINE PATTERN; PREVENTS POST-EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-10-29 | — | — | US | disclosed |
| EP-0667338-A1 | Sulfonium salt and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-16 | — | — | EP | disclosed |
| EP-0665220-A1 | Novel sulfonium salt and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-02 | — | — | EP | disclosed |