⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16399210 | 0.73 | — | — | |
| SCHEMBL28769736 | 0.70 | — | — | |
| SCHEMBL4640339 | 0.68 | — | — | |
| SCHEMBL16714833 | 0.68 | — | — | |
| SCHEMBL9491736 | 0.67 | — | — | |
| SCHEMBL16714777 | 0.66 | — | — | |
| SCHEMBL29286844 | 0.64 | DNM1 (0.35) | — | |
| SCHEMBL25933313 | 0.63 | — | — | |
| SCHEMBL2310735 | 0.63 | CTSK (0.33) | — | |
| SCHEMBL27048733 | 0.63 | DNM1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12606576-B2 | Method for producing nitrogen-containing organoxysilane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-21 | — | — | US | disclosed |
| EP-4006042-B1 | METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2024-01-31 | — | — | EP | disclosed |
| CN-114573630-A | Method for producing nitrogen-containing organooxysilane compound | 信越化学工业株式会社 | 2022-06-03 | — | — | CN | disclosed |
| US-20220169665-A1 | METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-02 | — | — | US | disclosed |
| EP-4006042-A1 | METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-01 | — | — | EP | disclosed |
| EP-1026553-A1 | Toner composition including positive and negative triboelectric charged hydrophobic extra-particulate additives | Lexmark International, Inc. (US) | 2000-08-09 | — | — | EP | disclosed |
| US-6004711-A | Toner composition including positive and negative tribocharging hydrophobic extra-particulate additives | LEXMARK INTERNATIONAL, INC. (US) | 1999-12-21 | — | — | US | disclosed |
| US-5202213-A | Prevents filming on photosensitive member | CANON KABUSHIKI KAISHA (JP) | 1993-04-13 | — | — | US | disclosed |