SCHEMBL8081440

SCHEMBL8081440

CCCN(C=C(C)C(=O)OCC)CCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLO1 Q04760 1/20 0.42
CYP2C9 P11712 1/20 0.40
NPSR1 Q6W5P4 2/20 0.38
ALDH1A1 P00352 5/20 0.38
LMNA P02545 2/20 0.38
HSD17B10 Q99714 1/20 0.38
MAPT P10636 2/20 0.35
CYP2D6 P10635 2/20 0.35
CYP2C19 P33261 1/20 0.35
TRPA1 O75762 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
FAAH O00519 2/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
S1PR4 O95977 1/20 0.34
S1PR1 P21453 1/20 0.34
MAPK1 P28482 1/20 0.34
TSHR P16473 1/20 0.33
EGLN1 Q9GZT9 1/20 0.32
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29157017 0.93 GLO1 (0.40) GLO1CYP2C9NPSR1ALDH1A1LMNA
SCHEMBL2834865 0.89 GLO1 (0.40) GLO1CYP2C9NPSR1ALDH1A1LMNA
SCHEMBL1853323 0.87 FAAH (0.41) GLO1CYP2C9NPSR1ALDH1A1LMNA
SCHEMBL8087663 0.87 HCAR2 (0.36) ALDH1A1LMNASMN1; SMN2TSHRGAA
SCHEMBL373413 0.84 GLO1 (0.45) GLO1CYP2C9NPSR1ALDH1A1LMNA
SCHEMBL28762869 0.81 TSHR (0.38) ALDH1A1TSHR
SCHEMBL28665056 0.80 FAAH (0.42) GLO1CYP2C9NPSR1MAPTFAAH
SCHEMBL28831579 0.79 GLO1 (0.38) GLO1CYP2C9NPSR1ALDH1A1LMNA
SCHEMBL6050203 0.78 GLO1 (0.40) GLO1CYP2C9NPSR1ALDH1A1LMNA
SCHEMBL134678 0.78 CYP2C9 (0.56) GLO1CYP2C9NPSR1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118256003-A CO2Polymer solution/nanosphere compound system responding to tackifying and preparation method thereof 中国石油化工股份有限公司 2024-06-28 CN disclosed
CN-117820526-A Modified ionic surfactant, preparation method thereof, water-based cleaning agent containing modified ionic surfactant and application of water-based cleaning agent 蒲城鲲鹏半导体材料有限公司 2024-04-05 CN disclosed
CN-117229440-A Preparation method and application of polymer carrier with twisted core structure 北京化工大学 2023-12-15 CN disclosed
EP-0735426-B1 Radiation curable polymers and method of producing the same DAINIPPON INK & CHEMICALS (JP) 2000-10-11 EP disclosed
US-5847022-A Radiation curable resin composition and method therefor DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-12-08 US disclosed
EP-0735426-A1 Radiation curable polymers and method of producing the same DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-02 EP disclosed