SCHEMBL8083172

SCHEMBL8083172

CCOC(CC)CC(=O)OC

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.39
MGAM O43451 2/20 0.36
GAA P10253 2/20 0.36
SI P14410 2/20 0.36
MGAM2 Q2M2H8 2/20 0.36
HSD17B10 Q99714 1/20 0.36
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
THRB P10828 1/20 0.31
TET2 Q6N021 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
MAPT P10636 1/20 0.30
RAB9A P51151 1/20 0.30
PDE4A P27815 1/20 0.30
PDE4B Q07343 1/20 0.30
PDE4C Q08493 1/20 0.30
PDE4D Q08499 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7881596 0.91 TSHR (0.42) TSHRMGAMGAASIMGAM2
SCHEMBL11852707 0.83 TSHR (0.36) TSHRMGAMGAASIMGAM2
SCHEMBL8911100 0.83 GAA (0.46) TSHRMGAMGAASIMGAM2
SCHEMBL9620366 0.82 TSHR (0.42) TSHRMGAMGAASIMGAM2
SCHEMBL9472747 0.82 TSHR (0.34) TSHRMGAMGAASIMGAM2
SCHEMBL2548479 0.79 TDP1 (0.33) TSHRMGAMGAASIMGAM2
SCHEMBL9744376 0.79 DNM1 (0.43) CA1CA2
SCHEMBL15074156 0.79 ALDH1A1 (0.37) TSHRMGAMGAASIMGAM2
SCHEMBL15144339 0.78 TSHR (0.39) TSHRMGAMGAASIMGAM2
SCHEMBL15672632 0.77 ALDH1A1 (0.47) TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0745575-B1 Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO LTD (JP) 2000-09-06 EP disclosed
EP-0629894-B1 Method for domain-dividing liquid crystal alignment film and liquid crystal device using such film JAPAN SYNTHETIC RUBBER CO LTD (JP) 1999-08-04 EP disclosed
EP-0520626-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1999-03-10 EP disclosed