SCHEMBL808427

SCHEMBL808427

CCCCOC(O)OCCCC

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.42
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41
ALDH1A1 P00352 2/20 0.40
DNM1 Q05193 1/20 0.39
ATM Q13315 1/20 0.37
USP2 O75604 1/20 0.37
CYP3A4 P08684 2/20 0.36
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CNR1 P21554 1/20 0.35
CNR2 P34972 1/20 0.35
HSD17B10 Q99714 1/20 0.35
HPGD P15428 1/20 0.34
GBA1 P04062 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7712111 0.92 TSHR (0.37) TSHRADRB2ADRB1ADRB3ALDH1A1
SCHEMBL16275184 0.92 DNM1 (0.48) ALDH1A1DNM1USP2HTTCNR1
SCHEMBL18270714 0.89 DNM1 (0.52) DNM1USP2HTTGBA1
SCHEMBL8866099 0.87
SCHEMBL17832934 0.85 USP2 (0.50) DNM1USP2HTTGBA1
SCHEMBL7022237 0.84 TSHR (0.37) TSHRADRB2ADRB1ADRB3ALDH1A1
SCHEMBL1053701 0.82
SCHEMBL14975586 0.82 TSHR (0.42) TSHRADRB2ADRB1ADRB3ALDH1A1
SCHEMBL1567580 0.81 HSD17B10 (0.43) TSHRALDH1A1USP2HTTTDP1
SCHEMBL16760959 0.81 DNM1 (0.41) ALDH1A1DNM1USP2HTTCNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112940812-A Oxygen-containing type high-cetane number secondary standard fuel 军事科学院系统工程研究院军事新能源技术研究所 2021-06-11 CN claimed
US-20240218153-A1 POLYACETAL RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-07-04 US disclosed
EP-4368315-A1 POLYACETAL RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-05-15 EP disclosed
US-11965058-B2 Oxymethylene-copolymer manufacturing method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-04-23 US disclosed
EP-3683247-B1 OXYMETHYLENE-COPOLYMER MANUFACTURING METHOD MITSUBISHI GAS CHEMICAL CO (JP) 2024-03-27 EP disclosed
CN-117580879-A Process for producing polyacetal copolymer 宝理塑料株式会社 2024-02-20 CN disclosed
CN-117561305-A Polyacetal resin composition 三菱瓦斯化学株式会社 2024-02-13 CN disclosed
US-11898033-B2 Oxymethylene copolymer resin composition and method for producing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-02-13 US disclosed
WO-2023243658-A1 POLYACETAL RESIN COMPOSITION 三菱瓦斯化学株式会社 2023-12-21 WO disclosed
EP-4282911-A1 POLYACETAL RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-29 EP disclosed
EP-1270629-A1 POLYACETAL COPOLYMER POLYPLASTICS CO. LTD. (JP) 2003-01-02 EP disclosed
US-20020193469-A1 Branched polyacetal resin composition POLYPLASTICS CO., LTD. (JP) 2002-12-19 US disclosed
US-20020193480-A1 Branched polyacetal resin composition POLYPLASTICS CO., LTD. (JP) 2002-12-19 US disclosed
US-6426393-B1 COPOLYMERIZING TRIOXANE WITH GLYCIDYL ETHER/ESTER AND ETHYLENE GLYCOL FORMING EPOXY/ACTAL RESIN HAVING EXCELLENT SHOCK RESISTANCE, RIGIDITY, CREEP RESISTANCE, AND HEAT RESISTANCE DURING MOLDING; MATERIALS HANDLING POLYPLASTICS CO., LTD. (JP) 2002-07-30 US disclosed
EP-1215245-A1 POLYACETAL RESIN COMPOSITION POLYPLASTICS CO. LTD. (JP) 2002-06-19 EP disclosed
US-6365704-B1 COPOLYMER OF TRIOXANE AND COMPOUND WITH GLYCIDYL GROUPS POLYPLASTICS CO., LTD. (JP) 2002-04-02 US disclosed
EP-1167409-A1 POLYACETAL COPOLYMER AND METHOD FOR PRODUCING THE SAME POLYPLASTICS CO. LTD. (JP) 2002-01-02 EP disclosed
EP-1120431-A1 COPOLYACETAL POLYPLASTICS CO. LTD. (JP) 2001-08-01 EP disclosed
US-6255440-B1 POLYACETAL COPOLYMERS OBTAINED BY COPOLYMERIZING TRIOXANE, AT LEAST ONE GLYCIDYL ETHER COMPOUND, OPTIONAL CYCLIC ETHER COMPOUND COPOLYMERIZABLE WITH TRIOXANE POLYPLASTICS CO., LTD. (JP) 2001-07-03 US disclosed
US-5631308-A SELF-POLISHING METALLIZED COPOLYMER KOREA CHEMICAL CO., LTD. (KR) 1997-05-20 US disclosed