Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDK1 | P06493 | 3/20 | 0.47 |
| ▸ | CCNB1 | P14635 | 3/20 | 0.47 |
| ▸ | CCNA2 | P20248 | 2/20 | 0.47 |
| ▸ | CDK2 | P24941 | 2/20 | 0.47 |
| ▸ | CCNA1 | P78396 | 2/20 | 0.47 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 2/20 | 0.41 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.41 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL379413 | 0.86 | HSD17B10 (0.49) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL598441 | 0.84 | CYP2D6 (0.43) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL9572220 | 0.81 | CDK1 (0.43) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL29340871 | 0.81 | CDK1 (0.46) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL9769720 | 0.79 | TSHR (0.48) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL8214121 | 0.77 | TLR8 (0.42) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL2990823 | 0.77 | CDK1 (0.46) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL899058 | 0.77 | NR5A1 (0.43) | CDK1CCNB1CCNA2CDK2CCNA1 | |
| SCHEMBL379319 | 0.77 | SMN1; SMN2 (0.46) | LMNAHSD17B10HTTCYP1A2NPC1 | |
| SCHEMBL4139670 | 0.76 | CDK1 (0.40) | CDK1CCNB1CCNA2CDK2CCNA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 277 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101981122-B | Polyacetal resin composition | MITSUBISHI GAS CHEMICAL CO | 2013-05-15 | — | — | CN | claimed |
| EP-1123082-B1 | PREPARATIONS FOR TOPICAL APPLICATION OF SUBSTANCES HAVING ANTIANDROGENIC EFFECT | AVENTIS PHARMA SA (FR) | 2006-03-01 | — | — | EP | claimed |
| EP-0879052-B1 | PREPARATIONS STIMULATING NAIL GROWTH | AVENTIS PHARMA GMBH (DE) | 2000-12-20 | — | — | EP | claimed |
| EP-0397582-B1 | Imide groups containing polymers made from hindered diamines | CIBA GEIGY AG (CH) | 1994-12-14 | — | — | EP | claimed |
| US-5122590-A | Addition-condensation copolymer comprising an N,N*-bismaleimide, hindered aromatic diprimary diamine, a diamino-s-triazine, a halogenated epoxy resin and a diallyl oxylated benzene; heat resistance; prepregs | RHONE-POULENC CHIMIE (FR) | 1992-06-16 | — | — | US | claimed |
| US-6384179-B1 | — | — | None | — | — | US | disclosed |
| US-20250360691-A1 | RELEASE FILM AND LAMINATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250333609-A1 | HYDROPHILIC COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-30 | — | — | US | disclosed |
| EP-3431520-B1 | PROCESS FOR PRODUCING OXYMETHYLENE COPOLYMER | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-09-24 | — | — | EP | disclosed |
| WO-2025089072-A1 | POLYACETAL RESIN COMPOSITION | ポリプラスチックス株式会社 | 2025-05-01 | — | — | WO | disclosed |
| WO-2025089071-A1 | POLYACETAL RESIN COMPOSITION | ポリプラスチックス株式会社 | 2025-05-01 | — | — | WO | disclosed |
| WO-2025079317-A1 | HYDROPHILIC COMPOSITION | 信越化学工業株式会社 | 2025-04-17 | — | — | WO | disclosed |
| US-5128405-A | Preventing depolymerization | POLYPLASTICS CO., LTD. (JP) | 1992-07-07 | — | — | US | disclosed |
| EP-0492974-A2 | Stabilized polyoxymethylene resin composition | POLYPLASTICS CO. LTD. (JP) | 1992-07-01 | — | — | EP | disclosed |
| US-5122590-A | Addition-condensation copolymer comprising an N,N*-bismaleimide, hindered aromatic diprimary diamine, a diamino-s-triazine, a halogenated epoxy resin and a diallyl oxylated benzene; heat resistance; prepregs | RHONE-POULENC CHIMIE (FR) | 1992-06-16 | — | — | US | disclosed |
| EP-0435649-A1 | Polyoxymethylene composition | POLYPLASTICS CO. LTD. (JP) | 1991-07-03 | — | — | EP | disclosed |
| CN-1009106-B | STABILIZED OXYMETHYLENE POLYMERS | CELANESE CORP (US) | 1990-08-08 | — | — | CN | disclosed |
| CN-87100470-A | Stable yuban | — | 1987-10-28 | — | — | CN | disclosed |
| EP-0185543-A2 | Thermal stabilization of acetal polymers | CELANESE CORPORATION (US) | 1986-06-25 | — | — | EP | disclosed |
| US-4342680-A | WITH AN AMINE SUBSTITUTED TRIAZINE, A PHENOL, AND AN ALKALI METAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1982-08-03 | — | — | US | disclosed |